US2022250943A1PendingUtilityA1

Microwave drying apparatus for the minimization of drinking water plant residuals

Assignee: US ENVIRONMENTPriority: Mar 1, 2017Filed: Apr 28, 2022Published: Aug 11, 2022
Est. expiryMar 1, 2037(~10.6 yrs left)· nominal 20-yr term from priority
H05B 6/804C02F 1/302C02F 11/131
63
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Claims

Abstract

A method and apparatus for treating residuals or waste streams from a plant, such as a drinking water treatment plant. The method includes the steps of obtaining plant residuals or waste streams from a water treatment plant and irradiating the plant residuals or waste streams using microwave radiation from a microwave source. The method also includes the step of drying the plant residuals or waste streams to a predetermined moisture, volume, or weight content reduction and disposing of the same.

Claims

exact text as granted — not AI-modified
1 . An apparatus for treating residuals from a water treatment plant comprising:
 a processing vessel configured to store plant residuals from a water treatment plant; and   a microwave radiation source configured to dry the plant residuals in the processing vessel by heating using microwave radiation.   
     
     
         2 . The apparatus according to  claim 1 , wherein the processing vessel comprises ceramic, refractive, or china materials. 
     
     
         3 . The apparatus according to  claim 1 , where the processing vessel is open to the atmosphere. 
     
     
         4 . The apparatus according to  claim 1 , wherein the processing vessel is configured to operate in a batch mode operation. 
     
     
         5 . The apparatus according to  claim 1 , wherein the microwave radiation source is a magnetron. 
     
     
         6 . The apparatus according to  claim 5 , wherein the magnetron is configured to produce microwave radiation having a wavelength between 5 centimeters and 40 centimeters. 
     
     
         7 . An apparatus for treating residuals from a water treatment plant comprising:
 a processing vessel configured to store plant residuals from a water treatment plant; and   a microwave radiation source configured to dry and treat the plant residuals in the processing vessel by irradiating the plant residuals using microwave radiation from the microwave source, at a power output between 0.1 and 100 kW at 500 MHz to 2500 MHz frequencies to control a temperature in the processing vessel to be between 90° C. and 125° C.,   wherein the processing vessel comprises ceramic, refractive, or china materials that reflect radiation.   
     
     
         8 . The apparatus of  claim 7 , wherein the processing vessel is open to atmosphere. 
     
     
         9 . The apparatus of  claim 7 , wherein the microwave source is a magnetron, and the magnetron powered is powered between 0.1 and 50 kW. 
     
     
         10 . The apparatus of  claim 9 , wherein the microwave radiation has a wavelength between 5 centimeters and 40 centimeters. 
     
     
         11 . The apparatus of  claim 7 , wherein the microwave radiation source is configured to irradiate the plant residuals in five minute intervals until the plant residuals are dried to at least an 80% moisture reduction percentage. 
     
     
         12 . The apparatus of  claim 7 , wherein the microwave radiation source is configured to irradiate the plant residuals until the plant residuals are dried to at least 80% volume reduction. 
     
     
         13 . The apparatus of  claim 7 , wherein the microwave radiation source is configured to irradiate the plant residuals until the plant residuals are dried to at least 80% weight reduction. 
     
     
         14 . An apparatus for treating residuals from a water treatment plant comprising:
 a processing vessel configured to store plant residuals from a water treatment plant; and   a microwave radiation source configured to dry and treat the plant residuals in the processing vessel by irradiating the plant residuals using microwave radiation from the microwave source, at a power output between 0.1 and 100 kW at 500 MHz to 2500 MHz frequencies to control a temperature in the processing vessel to be between 90° C. and 125° C., wherein the processing vessel is formed of ceramic materials.

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