PRODUCTION METHOD OF 225Ac

Abstract

One embodiment of the present invention relates to a production method of 225 Ac includes; a production step of a 226 Ra target including an electrodeposition step of electrodepositing a 226 Ra-containing substance on a substrate by using an electrodeposition solution that contains 226 Ra ions and a pH buffer, and an irradiating step of irradiating the 226 Ra target with at least one selected from charged particles, photons, and neutrons.

1 . A production method of  225 Ac comprising;
 a production step of a  226 Ra target comprising an electrodeposition step of electrodepositing a  226 Ra-containing substance on a substrate by using an electrodeposition solution that contains  226 Ra ions and a pH buffer, and   an irradiating step of irradiating the  226 Ra target with at least one selected from charged particles, photons, and neutrons.   
     
     
         2 . The production method according to  claim 1 , wherein the electrodeposition solution is substantially free of alcohols. 
     
     
         3 . The production method according to  claim 1 , wherein:
 the electrodeposition solution comprises one acid or two or more acids, and   the acids are monovalent or divalent acids.   
     
     
         4 . The production method according to  claim 1 , wherein the electrodeposition solution comprises carboxylate ions. 
     
     
         5 . The production method according to  claim 1 , wherein the electrodeposition solution is acidic at the start of the electrodeposition step. 
     
     
         6 . The production method according to  claim 1 , wherein the electrodeposition solution has a pH of 4 to 9 during the electrodeposition step. 
     
     
         7 . The production method according to  claim 1 , wherein the pH buffer is a monocarboxylate or dicarboxylate salt.