Base station and cleaning robot system

Abstract

The present disclosure relates to the field of smart home technology and proposes a base station and a cleaning robot system. A base station applicable to clean a cleaning mechanism of a cleaning robot includes a cleaning tank, configured to accommodate at least part of the cleaning mechanism and clean the at least part of the cleaning mechanism, the cleaning tank includes a first end face and a second end face, a direction of a connection line between the first end face and the second end face is substantially parallel to an extension direction of the cleaning mechanism. A cleaning robot system is further provided.

1 . A base station applicable to clean a cleaning mechanism of a cleaning robot, the base station comprising:
 a cleaning tank, configured to accommodate at least part of the cleaning mechanism and clean the at least part of the cleaning mechanism, wherein the cleaning tank comprises a first end face and a second end face, and a direction of a connection line between the first end face and the second end face is substantially parallel to an extension direction of a rotation axis of the cleaning mechanism; and   a cleaning wiper, arranged to extend between the first end face and the second end face of the cleaning tank.   
     
     
         2 . The base station according to  claim 1 , wherein the second end face is configured to discharge cleaning liquid accommodated in the cleaning tank for cleaning the cleaning mechanism; and
 the base station further comprises a first filter arranged close to the second end face.   
     
     
         3 . The base station according to  claim 1 , wherein the cleaning wiper is configured to squeeze the cleaning mechanism, and wherein the cleaning wiper comprises a plurality of protrusions arranged at intervals. 
     
     
         4 . The base station according to  claim 3 , wherein the cleaning wiper further comprises a connection plate arranged on a bottom wall of the cleaning tank and extending along an extension direction of the cleaning tank; and
 the plurality of protrusions are arranged at intervals on the connection plate.   
     
     
         5 . The base station according to  claim 1 , further comprising:
 a first pump in communication with the cleaning tank, configured to pump cleaning liquid into the cleaning tank; and   a second pump in communication with the cleaning tank, configured to pump the cleaning liquid out of the cleaning tank.   
     
     
         6 . The base station according to  claim 5 , wherein the first pump and the second pump are configured to operate at the same time, the first pump is configured to spout the cleaning liquid into the cleaning tank, and the second pump is configured to pump the cleaning liquid out of the cleaning tank; and
 wherein only the second pump operates while the first pump does not operate, such that the cleaning liquid is drained out of the cleaning tank.   
     
     
         7 . The base station according to  claim 5 , further comprising:
 a liquid level detector, configured to detect a liquid level of the cleaning liquid in the cleaning tank, wherein the liquid level detector comprises:
 a signal transmitter; 
 a signal receiver, arranged opposite to the signal transmitter; 
 a support member; 
 a connection rod, rotatably arranged on the support member; 
 a first floater, arranged at a first end face of the connection rod and located in the cleaning tank, wherein the first floater is configured to drive the connection rod to rotate relative to the support member under an effect of the cleaning liquid; and 
 a shielding member, arranged at a second end face of the connection rod and configured to move vertically in response to the rotation of the connection rod, when the shielding member moves to a position between the signal transmitter and the signal receiver, a signal connection between the signal transmitter and the signal receiver is disconnected; 
 wherein in response to the signal connection between the signal transmitter and the signal receiver being disconnected, the first pump pumps the cleaning liquid into the cleaning tank. 
   
     
     
         8 . The base station according to  claim 5 , further comprising:
 a diversion trench, located on a first side of the cleaning tank and being in communication with the cleaning tank, such that the cleaning liquid returns into the cleaning tank after the cleaning liquid enters the diversion trench; and   an auxiliary container, located on a second side of the cleaning tank and arranged independently of the cleaning tank; and   the second pump is in communication with the auxiliary container, such that the second pump pumps away the cleaning liquid after the cleaning liquid enters the auxiliary container.   
     
     
         9 . The base station according to  claim 8 , wherein a sealing strip is arranged between the auxiliary container and the cleaning tank, such that the cleaning liquid in the cleaning container is prevented from entering the auxiliary container. 
     
     
         10 . The base station according to  claim 8 , wherein a liquid outlet is arranged on the auxiliary container, and the liquid outlet is in communication with the second pump, and
 the base station further comprises a second floater, arranged in the auxiliary container to provide shielding on the liquid outlet,   wherein the second floater floats up in response to the cleaning liquid existing in the auxiliary container, such that the second pump is in communication with the auxiliary container.   
     
     
         11 . The base station according to  claim 1 , further comprising:
 a drying mechanism, configured to dry the cleaning mechanism,   wherein the drying mechanism and the cleaning tank are located at two ends of the base station respectively.   
     
     
         12 . The base station according to  claim 11 , further comprising a through hole arranged apart from the cleaning tank;
 wherein the drying mechanism is configured to dry the cleaning mechanism through the through hole.   
     
     
         13 . The base station according to  claim 1 , further comprising a guide bottom surface provided with an anti-skid protrusion;
 wherein the cleaning robot is configured to move onto the guide bottom surface along the anti-skid protrusion; and   the cleaning tank is arranged on the guide bottom surface and spaced from the anti-skid protrusion.   
     
     
         14 . The base station according to  claim 1 , further comprising:
 a first charging electrode, configured to be electrically connected with a second charging electrode of the cleaning robot; and a guide side surface, wherein the first charging electrode is arranged on the guide side surface and electrode above the cleaning container.   
     
     
         15 . The base station according to  claim 1 , further comprising:
 a guide side surface; and   a guide wheel, arranged on the guide side surface for contact with the cleaning robot;   wherein the guide wheel ( 361 ) is located above the cleaning tank.   
     
     
         16 . The base station according to  claim 1 , further comprising a guide top surface;
 wherein a lock block configured to contact with the cleaning robot is arranged on the guide top surface and above the cleaning tank.   
     
     
         17 . A base station, applicable to clean a cleaning mechanism of a cleaning robot, comprising:
 a cleaning container, configured to accommodate at least part of the cleaning mechanism and clean the at least part of the cleaning mechanism; and   a sewage tank in communication with the cleaning tank, wherein the sewage tank is provided with a liquid inlet, and cleaning liquid entering the sewage tank through the liquid inlet is configured to flush the cleaning liquid in the sewage tank, wherein the liquid inlet is provided on at least one of a side wall and a bottom of the sewage tank.   
     
     
         18 . The base station according to  claim 17 , wherein the cleaning tank is further provided with a liquid inlet, the sewage tank is provided with a liquid outlet which is configured to discharge the cleaning liquid in the sewage tank. 
     
     
         19 . A cleaning robot system, comprising:
 a cleaning robot, comprising a cleaning mechanism; and   a base station, comprising a cleaning tank configured to accommodate at least part of the cleaning mechanism and clean the at least part of the cleaning mechanism, wherein the cleaning tank comprises a first end face and a second end face, and a direction of a connection line between the first end face and the second end face is substantially parallel to an extension direction of the cleaning mechanism.   
     
     
         20 . The cleaning robot system according to  claim 19 , wherein the cleaning mechanism comprises at least one of a sweeping brushroll and a mopping brushroll.