US2023034034A1PendingUtilityA1
Low-voc cleaning substrates and compositions
Est. expiryJul 6, 2032(~5.9 yrs left)· nominal 20-yr term from priority
C11D 1/72C11D 3/48C11D 1/66A47L 13/17C11D 1/835C11D 3/43C11D 1/62A01N 33/12C11D 1/008
85
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Claims
Abstract
The present invention is directed to a cleaning composition for sanitizing or disinfecting hard surfaces containing a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
Claims
exact text as granted — not AI-modifiedWe claim:
1 . A cleaning system comprising:
(a) a moisture-impervious container; (b) a substrate housed within the moisture-impervious container; and (c) a cleaning composition loaded onto the substrate, the cleaning composition consisting of: i. about 0.01-2% by weight of one or more quaternary ammonium compounds; ii. about 0.001-1% by weight of a surfactant selected from the group consisting of: lauryl sulfate, lauryl ether sulfate, cocamidopropylbetaine, alkyl polyglycoside, and any combinations or mixtures thereof, iii. about 0.1-2% by weight of a first solvent selected form the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof; iv. about 0.1-2% by weight of a second solvent that is different from the first solvent, selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof; iii. at least about 90% by weight of water; and v. optionally, one or more buffers selected from the group consisting of: monoethanolamine, diethanolamine, triethanolamine; tri(hydroxymethyl) amino methane, 2-amino-2-ethyl-1,3-propanediol, 2-amino-2-methyl-propanol, 2-amino-2-methyl-1,3-propanol, methyl diethanolamide, 2-dimethylamino-2-methylpropanol, 1,3-bis(methylamine)-cyclohexane, 1,3-diamino-propanol N,N′-tetra-methyl-1,3-diamino-2-propanol, N,N-bis(2-hydroxyethyl)glycine, tris(hydroxymethyl)methyl glycine, ammonium carbamate, citric acid, acetic acid, ammonia and any mixtures or combinations thereof; vi. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, defoamers, enzymes, dyes, colorants and preservatives.
2 . The system as defined in claim 1 , wherein the composition includes one or more buffers comprising monoethanolamine.
3 . The system as defined in claim 1 , wherein the composition comprises a fragrance.
4 . The system as defined in claim 1 , wherein said one or more quaternary ammonium compounds comprises at least one of n-alkyldimethylbenzylammonium chloride or n-alkyldimethylethylbenzylammonium chloride.
5 . The system as defined in claim 1 , wherein the surfactant is an alkyl polyglycoside.
6 . The system as defined in claim 1 , wherein said first solvent includes a C1-10 alkyl ether of alkylene glycol.
7 . The system as defined in claim 1 , wherein the first solvent includes a C1-10 alkyl ether of propylene glycol.
8 . The system as defined in claim 1 , wherein the second solvent is an alcohol.
9 . A cleaning system comprising:
(a) a moisture-impervious container; (b) a substrate housed within the moisture-impervious container; and (c) a cleaning composition loaded onto the substrate, the cleaning composition consisting of: i. about 0.01-2% by weight of one or more quaternary ammonium compounds; ii. about 0.001-1% by weight of an alkyl polyglycoside surfactant; iii. about 0.1-2% by weight of a first solvent selected form the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof; iv. about 0.1-2% by weight of a second solvent that is different from the first solvent, selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof; v. about 0.001-1% by weight of a buffer selected from the group consisting of: monoethanoleamine, diethanolamine, triethanolamine; tri(hydroxymethyl) amino methane, 2-amino-2-ethyl-1,3-propanediol, 2-amino-2-methyl-propanol, 2-amino-2-methyl-1,3-propanol, methyl diethanolamide, 2-dimethylamino-2-methylpropanol, 1,3-bis(methylamine)-cyclohexane, 1,3-diamino-propanol N,N′-tetra-methyl-1,3-diamino-2-propanol, N,N-bis(2-hydroxy ethyl)glycine, tris(hydroxymethyl)methyl glycine, ammonium carbamate, citric acid, acetic acid, ammonia and any mixtures or combinations thereof; vi. at least about 90% by weight of water; and vii. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, defoamers, dyes, colorants and preservatives.
10 . The system as defined in claim 9 , wherein the buffer is monoethanolamine.
11 . The system as defined in claim 9 , wherein the composition further comprises a fragrance.
12 . The system as defined in claim 9 , wherein said one or more quaternary ammonium compounds comprises at least one of n-alkyldimethylbenzylammonium chloride or n-alkyldimethylethylbenzylammonium chloride.
13 . The system as defined in claim 9 , wherein said second solvent is ethanol.
14 . The system as defined in claim 9 , wherein the first solvent includes a C1-10 alkyl ether of alkylene glycol.
15 . The system as defined in claim 9 , wherein the second solvent is an alcohol.
16 . A cleaning system comprising:
(a) a moisture-impervious container; (b) a substrate housed within the moisture-impervious container; and (c) a cleaning composition loaded onto the substrate, the cleaning composition consisting of: i. about 0.01-2% by weight of one or more quaternary ammonium compounds, ii. about 0.1-0.8% by weight of an alkyl polyglycoside surfactant; iii. about 0.1-2% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof, iv. about 0.01-2% by weight of a second solvent that is an alcohol; v. one or more buffers selected from the group consisting of: monoethanoleamine, diethanolamine, triethanolamine; tri(hydroxymethyl) amino methane, 2-amino-2-ethyl-1,3-propanediol, 2-amino-2-methyl-propanol, 2-amino-2-methyl-1,3-propanol, methyl diethanolamide, 2-dimethylamino-2-methylpropanol, 1,3-bis(methylamine)-cyclohexane, 1,3-diamino-propanol N,N′-tetra-methyl-1,3-diamino-2-propanol, N,N-bis(2-hydroxyethyl)glycine, tris(hydroxymethyl)methyl glycine, ammonium carbamate, citric acid, acetic acid, ammonia and any mixtures or combinations thereof; vi. one or more fragrances; and vii. at least 90% by weight of water.
17 . The system as defined in claim 16 , wherein said buffer is monoethanolamine.
18 . The system as defined in claim 16 , the first solvent includes a C1-10 alkyl ether of propylene glycol.
19 . The system as defined in claim 16 , wherein said one or more quaternary ammonium compounds comprise at least one of n-alkyldimethylbenzylammonium chloride or n-alkyldimethylethylbenzylammonium chloride.
20 . The system as defined in claim 16 , wherein said second solvent is ethanol.Join the waitlist — get patent alerts
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