US2023093384A1PendingUtilityA1

Synthesis and use of precursors for ald of group va element containing thin films

83
Assignee: ASM IP HOLDING BVPriority: Oct 26, 2009Filed: Nov 16, 2022Published: Mar 23, 2023
Est. expiryOct 26, 2029(~3.3 yrs left)· nominal 20-yr term from priority
H10P 14/3424H10P 14/3402H10P 14/3422H10P 14/3421H10P 14/3418H10P 14/3414H10P 14/24C23C 16/305H10N 70/231C23C 16/45553C23C 16/4408H10N 70/023H10N 70/8828C23C 16/45555C23C 16/18H10N 70/884H01L 45/144H01L 21/02549H01L 21/02546H01L 21/02543H01L 45/1616H01L 21/02551H01L 45/148H01L 21/02538H01L 21/0262H01L 21/02521H01L 45/06H10P 14/66H10P 14/6339
83
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Claims

Abstract

Atomic layer deposition (ALD) processes for forming Group VA element containing thin films, such as Sb, Sb—Te, Ge—Sb and Ge—Sb—Te thin films are provided, along with related compositions and structures. Sb precursors of the formula Sb(SiR1R2R3)3 are preferably used, wherein R1, R2, and R3 are alkyl groups. As, Bi and P precursors are also described. Methods are also provided for synthesizing these Sb precursors. Methods are also provided for using the Sb thin films in phase change memory devices.

Claims

exact text as granted — not AI-modified
We claim: 
     
         1 . A method for making a precursor comprising Bi, the method comprising:
 forming a first product by reacting a Group IA metal with a compound comprising Bi; and   subsequently combining a second reactant comprising R 1 R 2 R 3 SiX with the first product, wherein R 1 , R 2  and R 3  are alkyl groups with one or more carbon atoms and X is a halogen atom, thereby forming the precursor comprising Bi, wherein the precursor has a formula Bi(SiR 1 R 2 R 3 ) 3 .   
     
     
         2 . The method of  claim 1 , wherein the Group IA metal is Na, Li or K. 
     
     
         3 . The method of  claim 1 , wherein the compound comprising Bi is elemental Bi. 
     
     
         4 . The method of  claim 1 , wherein the second reactant comprises Et 3 SiCl and the precursor with the formula Bi(SiEt 3 ) 3  is formed. 
     
     
         5 . The method of  claim 1 , wherein the second reactant comprises Me 3 SiCl and the precursor with the formula Bi(SiMe 3 ) 3  is formed. 
     
     
         6 . The method of  claim 1 , wherein R 1  and R 2  are methyl groups and R 3  is a tertbutyl group, and the precursor with the formula Bi(SiMe 2   t Bu) 3  is formed. 
     
     
         7 . The method of  claim 1 , wherein one or more of DME, THF, toluene, and xylene is used as a solvent in the reaction forming the first product. 
     
     
         8 . The method of  claim 1 , wherein a hydrocarbon is used as a solvent and naphthalene or ammonia is used as a catalyst in the reaction forming the first product. 
     
     
         9 . The method of  claim 1 , wherein R 1 , R 2  and R 3  are all the same group. 
     
     
         10 . The method of  claim 1 , wherein R 1 , R 2  and R 3  are all different groups. 
     
     
         11 . A method for making a precursor comprising Bi, the method comprising:
 forming a first product by reacting a Group IA metal with a compound comprising Bi; and   subsequently combining a second reactant having the formula R 1 R 2 R 3 AX with the first product, wherein R 1 , R 2  and R 3  are alkyl groups with one or more carbon atoms, A is Si, Sn, or Ge, and X is a halogen atom, thereby forming the precursor comprising Bi, wherein the precursor has a formula Bi(AR 1 R 2 R 3 ) 3 .   
     
     
         12 . The method of  claim 11 , wherein the Group IA metal is Na, Li or K. 
     
     
         13 . The method of  claim 11 , wherein the compound comprising Bi is elemental Bi. 
     
     
         14 . The method of  claim 11 , wherein the second reactant has the formula R 1 R 2 R 3 SiX. 
     
     
         15 . The method of  claim 11 , wherein the second reactant is Et 3 ACl and the precursor comprising Bi is Bi(AEt 3 ) 3 . 
     
     
         16 . The method of  claim 15 , wherein the second reactant is Et 3 SiCl and the precursor comprising Bi is Bi(SiEt 3 ) 3 . 
     
     
         17 . The method of  claim 11 , wherein the second reactant is Me 3 ACl and the precursor comprising Bi is Bi(AMe 3 ) 3 . 
     
     
         18 . The method of  claim 11 , wherein the second reactant is Me 2   1 ′BuAX and the precursor comprising Bi is Bi(AMe 2   1 ′Bu) 3 . 
     
     
         19 . The method of  claim 11 , wherein one or more of DME, THF, toluene, and xylene is used as a solvent in the reaction forming the first product. 
     
     
         20 . The method of  claim 11 , wherein a hydrocarbon is used as a solvent and naphthalene is used as a catalyst in the reaction forming the first product.

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