Vapor chamber device

Abstract

A vapor chamber device adapted to be thermally coupled to a heat source includes a first casing and a second casing. The first casing includes a first plate, a first capillary structure at an inner surface of the first plate, and a first lateral wall protruding from the inner surface and surrounding the first capillary structure. The heat source is adapted to contact an outer surface of the first plate. The second casing is stacked on the first casing and includes a second plate, a plurality of supporting posts protruding from the second plate, and a second lateral wall protruding from the second plate and surrounding the supporting posts. The supporting posts face towards the first capillary structure, and the first lateral wall is connected to the second lateral wall. The vapor chamber device includes a second capillary structure disposed between the first capillary structure and the supporting posts, and a third capillary structure disposed in an area which is at the inner surface of the first plate and corresponds to the heat source.

What is claimed is: 
     
         1 . A vapor chamber device adapted to be thermally coupled to a heat source, the vapor chamber device comprising:
 a first casing comprising a first plate, a first capillary structure at an inner surface of the first plate, and a first lateral wall protruding from the inner surface and surrounding the first capillary structure, wherein the heat source is adapted to be in contact with an outer surface of the first plate, and the first capillary structure serves as a liquid channel;   a second casing stacked on the first casing and comprising a second plate, a plurality of supporting posts protruding from the second plate, and a second lateral wall protruding from the second plate and surrounding the supporting posts, wherein a plurality of vapor channels are formed between the supporting posts, the supporting posts face towards the first capillary structure, and the first lateral wall is connected to the second lateral wall;   a second capillary structure disposed between the first capillary structure and the supporting posts of the second casing, wherein the supporting posts abut against the second capillary structure; and   a third capillary structure disposed at the inner surface of the first plate and corresponding to the heat source, wherein the first plate is entirely integrally formed, the first capillary structure comprises a plurality of trenches formed between a plurality of protruding bars, a first area which is in the trenches and corresponds to the heat source is filled with the third capillary structure, a second area which is in the trenches and does not correspond to the heat source is not filled with the third capillary structure, and the third capillary structure comprises metal powders or non-woven metal wool.   
     
     
         2 . The vapor chamber device according to  claim 1 , wherein the supporting posts are evenly distributed on the second plate. 
     
     
         3 . The vapor chamber device according to  claim 1 , wherein one portion of the supporting posts is disposed corresponding to the heat source, and the other portion of the supporting posts is radially arranged around the one portion of the supporting posts as a center. 
     
     
         4 . The vapor chamber device according to  claim 1 , wherein the supporting posts comprise a plurality of rectangular posts, or a plurality of cylinders. 
     
     
         5 . The vapor chamber device according to  claim 1 , wherein the supporting posts comprise a plurality of conical posts, a plurality of trapezoidal posts, or a plurality of irregular posts. 
     
     
         6 . The vapor chamber device according to  claim 1 , wherein at least one portion of the trenches is radially arranged. 
     
     
         7 . The vapor chamber device according to  claim 1 , wherein a top surface of the second capillary structure and a top surface of the first lateral wall are located at a same plane.