Refractive index shaping laser writing process control

Abstract

Refractive index writing system and methods employing a pulsed laser source for providing a pulsed laser output at a first wavelength; an objective lens for focusing the pulsed laser output to a focal spot in an optical material; a scanner for relatively moving the focal spot with respect to the optical material at a relative speed and direction along a scan region for writing one or more traces in the optical material defined by a change in refractive index; and a controller for controlling laser exposures along the one or more traces in accordance with a calibration function for the optical material to achieve a desired refractive index profile in the optical material. The refractive index writing system may be for writing traces in in vivo optical tissue, and the controller may be configured with a calibration function obtained by calibrating refractive index change induced in enucleated ocular globes. A real-time process control monitor for detecting emissions from the optical material transmitted through the objective lens at a second wavelength may further be employed while writing the one or more traces.

1 - 35 . (canceled) 
     
     
         36 . A refractive index writing system comprising:
 a pulsed laser source for providing a pulsed laser output at a first wavelength;   an objective lens for focusing the pulsed laser output to a focal spot in an optical material;   a scanner for relatively moving the focal spot with respect to the optical material at a relative speed and direction along a scan region for writing one or more traces in the optical material defined by a change in refractive index;   a real-time process control monitor for detecting emissions from the optical material transmitted through the objective lens at a second wavelength while writing the one or more traces, comprising a photodetector, a lens for focusing the emissions transmitted through the objective lens onto the photodetector, and a filter for passing emissions at the second wavelength to the detector and blocking back-reflected pulse laser light of the first wavelength from the photodetector; and   a controller for controlling laser exposures along the one or more traces in accordance with a calibration function for the optical material to achieve a desired refractive index profile in the optical material by varying the laser power and/or relative scan speed for maintaining an energy profile within the optical material along the scan region above a nonlinear absorption threshold of the optical material and below a breakdown threshold of the optical material at which significant light scattering or absorption degrades the intended performance of the optical material, and for further controlling the laser exposure in response to an emission from the optical material at the second wavelength detected by the real-time process control monitor.   
     
     
         37 . A method of writing localized refractive index changes in optical materials with a refractive index writing system according to  claim 36  including a pulsed laser source providing a pulsed laser output at a first wavelength within energy regimes above a nonlinear absorption threshold of the optical materials and below a breakdown threshold of the optical materials at which significant light scattering or absorption degrades their intended performance, comprising steps of:
 producing a collimated output beam composed of a succession of pulses having a pulse energy between 0.01 nJ and 10 nJ, a pulse duration between 8 fs and 500 fs, and a repetition rate between 10 MHz and 500 MHz; 
 focusing the beam with an objective lens to a focal spot within the optical material; 
 relatively moving the objective lens with respect to the optical material at a relative speed and relative direction to write one or more traces defined by a change in refractive index of the optical material; 
 detecting emissions from the optical material transmitted through the objective lens at a second wavelength while writing the one or more traces by focusing the emissions transmitted through the objective lens onto a photodetector and blocking back-reflected pulse laser light of the first wavelength from the photodetector; and 
 controlling laser exposures along the one or more traces in accordance with a calibration function for the optical material to achieve a desired refractive index profile in the optical material by varying the laser power and/or relative scan speed to maintain an energy profile within the optical material along the scan region above a nonlinear absorption threshold of the optical material and below a breakdown threshold of the optical material at which significant light scattering or absorption degrades the intended performance of the optical material, and further controlling the laser exposure in response to a detected emission from the optical material at the second wavelength. 
 
     
     
         38 . The method of  claim 37 , wherein the laser exposure is reduced or stopped along the one or more traces in response to a detected emission at the second wavelength outside a predetermined detected emission intensity range. 
     
     
         39 . The method of  claim 38 , wherein the detected emission at the second wavelength is plasma luminescence. 
     
     
         40 . The method of  claim 38 , wherein the detected emission at the second wavelength is backscattered second harmonic generation. 
     
     
         41 . The method of  claim 37 , further comprising selectively passing different wavelengths of back reflected light or emissions to the photodetector. 
     
     
         42 . The method of  claim 37 , comprising simultaneously detecting back reflected light and emissions at different wavelengths with multiple photodetectors while writing the one or more traces. 
     
     
         43 . The method of  claim 37  in which the photodetector is a photodiode. 
     
     
         44 . The method of  claim 37 , further comprising selectively passing two-photon fluorescence emissions from the optical material transmitted through the objective lens through an additional filter to the detector, and monitoring two-photon fluorescence emissions from the optical material prior to writing the one or more scans to determine concentration of two-photon fluorescence emitter in the optical material. 
     
     
         45 . The writing system of  claim 36 , wherein the controller is configured to reduce or stop laser exposure along the one or more traces in response to a detected emission at the second wavelength outside a predetermined detected emission intensity range. 
     
     
         46 . The writing system of  claim 45 , wherein the process control monitor is configured to detect plasma luminescence emissions at the second wavelength. 
     
     
         47 . The writing system of  claim 45 , wherein the process control monitor is configured to detect backscattered second harmonic generation at the second wavelength. 
     
     
         48 . The writing system of  claim 36 , wherein the controller is configured to regulate the laser power for adjusting the laser exposure along a scan trace. 
     
     
         49 . The writing system of  claim 36 , wherein the controller is configured to regulate the relative scan speed for adjusting the laser exposure along a scan trace. 
     
     
         50 . The writing system of  claim 36 , wherein the real-time process control monitor comprises multiple filter elements for selectively passing different wavelengths of back reflected light or emissions to the photodetector. 
     
     
         51 . The writing system of  claim 36 , wherein the real-time process control monitor comprises multiple filter elements and multiple photodetectors for simultaneously detecting back reflected light or emissions at different wavelengths. 
     
     
         52 . The writing system of  claim 51  in which the photodetectors are each photodiodes. 
     
     
         53 . The writing system of  claim 36  in which the photodetector is a photodiode. 
     
     
         54 . The writing system of  claim 36 , wherein the real-time process control monitor further comprises an additional filter for selectively passing two-photon fluorescence emissions from the optical material transmitted through the objective lens to the detector. 
     
     
         55 . The writing system of  claim 36 , further comprising an ocular patient interface comprising a vacuum suction ring for coupling the writing system to a cornea of a patient.