Maskless photolithography devices, methods, and systems

Abstract

A device includes a light source and a light guide. The light source is configured to emit photoresist-curative electromagnetic radiation. The light guide is arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points.

What is claimed is: 
     
         1 . A device comprising:
 a light source configured to emit photoresist-curative electromagnetic radiation; and   a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points, wherein the emission points include an implanted region of the at least one surface.   
     
     
         2 . The device of  claim 1 , wherein the photoresist-curative electromagnetic radiation is ultraviolet (UV) light. 
     
     
         3 . The device of  claim 1 , where the emission points comprise a light diffusing layer or a lens imprinted on the at least one surface of the light guide. 
     
     
         4 . The device of  claim 1 , further including a photoresist disposed on a first surface of the light guide, the emission points formed on the first surface, wherein portions of the photoresist-are cured by the photoresist-curative electromagnetic radiation emitted at the emission points. 
     
     
         5 . The device of  claim 1 , wherein the light source is arranged to inject the photoresist-curative electromagnetic radiation into an edge of the light guide. 
     
     
         6 . A device comprising:
 a light source configured to emit photoresist-curative electromagnetic radiation; and   a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points, wherein the deposited light diffusing region includes a metal oxide.   
     
     
         7 . The device of  claim 6 , wherein the photoresist-curative electromagnetic radiation is ultraviolet (UV) light 
     
     
         8 . The device of  claim 6 , where the emission points comprise a light diffusing layer or a lens imprinted on the at least one surface of the light guide. 
     
     
         9 . The device of  claim 6 , further including a photoresist disposed on a first surface of the light guide, the emission points formed on the first surface, wherein portions of the photoresist are cured by the photoresist-curative electromagnetic radiation emitted at the emission points. 
     
     
         10 . The device of  claim 6 , wherein the light source is arranged to inject the photoresist-curative electromagnetic radiation into an edge of the light guide. 
     
     
         11 . A device comprising:
 a light source configured to emit photoresist-curative electromagnetic radiation; and   a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points, and   a photoresist disposed on a first surface of the light guide, the emission points formed on a second surface of the light guide opposite to the first surface, wherein portions of the photoresist-are cured by the photoresist-curative electromagnetic radiation emitted at the emission points   
     
     
         12 . The device of  claim 11 , wherein the photoresist-curative electromagnetic radiation is ultraviolet (UV) light. 
     
     
         13 . The device of  claim 11 , where the emission points comprise a light diffusing layer or a lens imprinted on the at least one surface of the light guide. 
     
     
         14 . The device of  claim 11 , further including a photoresist disposed on a first surface of the light guide, the emission points formed on the first surface, wherein portions of the photoresist-are cured by the photoresist-curative electromagnetic radiation emitted at the emission points. 
     
     
         15 . The device of  claim 11 , wherein the emission points include one of a roughened surface of the at least one surface or an implanted region of the at least one surface. 
     
     
         16 . A device comprising:
 a light source configured to emit photoresist-curative electromagnetic radiation; and   a light guide arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a film on at least one surface of the light guide, the film having a pattern of emission points, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points; and   a photoresist disposed on a first surface of the light guide, the emission points formed on the film on a second surface of the light guide opposite to the first surface, wherein portions of the photoresist-are cured by the photoresist-curative electromagnetic radiation emitted at the emission points.   
     
     
         17 . The device of  claim 16 , wherein the film has an index of refraction less than that of the light guide such that the film acts as an optical cladding to internally reflect the photoresist-curative electromagnetic radiation at an interface between the film, other than at the emission points, and the film. 
     
     
         18 . The device of  claim 16 , wherein the photoresist-curative electromagnetic radiation is ultraviolet (UV) light. 
     
     
         19 . The device of  claim 16 , wherein portions of the photoresist-are cured by the photoresist-curative electromagnetic radiation emitted at the emission points. 
     
     
         20 . The device of  claim 16 , wherein the deposited light diffusing region includes a metal oxide.