Deposition mask and method for manufacturing deposition mask

Abstract

A deposition mask includes a metal plate including first and second surfaces located opposite each other, through holes bored through the metal plate from the first surface to the second surface, and a flat region located between two through holes adjacent to each other in a case where the deposition mask is seen from the second surface side. The through holes are arrayed in a staggered arrangement in first and second directions in planar view. The flat region includes first and second flat regions located at first and second sides, respectively, of a first center line. The first center line passes through center points of two through holes adjacent to each other in the first direction. The first and second flat regions include portions in which dimensions of the first and second flat regions in the first direction increase away from the first center line, respectively.

What is claimed is: 
     
         1 . A deposition mask including two or more through holes, the deposition mask comprising:
 a metal plate including a first surface and a second surface located opposite the first surface;   the through holes each bored through the metal plate from the first surface to the second surface; and   a flat region located between two of the through holes adjacent to each other in a case where the deposition mask is seen from the second surface side,   wherein   the through holes are arrayed in a staggered arrangement in a first direction and a second direction in planar view,   the flat region includes a first flat region located at a first side of a first center line and a second flat region located at a second side of the first center line,   the first center line passes through center points of two of the through holes adjacent to each other in the first direction,   the first flat region includes a portion in which a dimension of the first flat region in the first direction increases away from the first center line, and   the second flat region includes a portion in which a dimension of the second flat region in the first direction increases away from the first center line.   
     
     
         2 . The deposition mask according to  claim 1 , wherein the first flat region and the second flat region are contiguous to each other. 
     
     
         3 . The deposition mask according to  claim 1 , wherein the first flat region and the second flat region are noncontiguous to each other. 
     
     
         4 . The deposition mask according to  claim 1 , wherein in a case where the deposition mask is seen from the second surface side, two of the through holes adjacent to each other in the second direction are connected to each other. 
     
     
         5 . The deposition mask according to  claim 1 , further comprising a third flat region located between two of the through holes adjacent to each other in the second direction in a case where the deposition mask is seen from the second surface side. 
     
     
         6 . The deposition mask according to  claim 1 , wherein
 the first flat region and the second flat region are contiguous to each other, and in a case where the deposition mask is seen from the second surface side, two of the through holes adjacent to each other in the second direction are connected to each other, and   a dimension in the first direction of a portion of the first flat region that overlaps the first center line is 0.90 time or less as great as a distance in the first direction between ends of two contours of the first flat region, the two contours facing the through holes in the first direction.   
     
     
         7 . The deposition mask according to  claim 1 , wherein
 the first flat region and the second flat region are contiguous to each other, and in a case where the deposition mask is seen from the second surface side, two of the through holes adjacent to each other in the second direction are connected to each other,   a dimension in a third direction of a portion of the flat region that overlaps a third center line is 1.00 time or less as great as a distance in the third direction between ends of two contours of the flat region, the two contours facing the through holes in the third direction,   the third direction is orthogonal to the first direction, and   the third center line passes through center points of two of the through holes adjacent to each other in the first direction and extends in the third direction.   
     
     
         8 . The deposition mask according to  claim 1 , wherein
 each of the through holes includes a first concave portion including a first wall surface located at the first surface and a second concave portion including a second wall surface located at the second surface, the second concave portion being connected to the first concave portion, and   the second wall surface includes a portion that becomes gradually closer to a center point of the through hole as the portion extends from the second surface toward the first surface.   
     
     
         9 . The deposition mask according to  claim 1 , wherein the flat region exhibits a pixel value greater than or equal to a reference value in a case where the deposition mask is observed with a laser microscope from the second surface side. 
     
     
         10 . The deposition mask according to  claim 1 , wherein a thickness of the flat region is equal to a thickness of the metal plate. 
     
     
         11 . The deposition mask according to  claim 1 , wherein the metal plate has a thickness of 50 μm or less. 
     
     
         12 . A method for manufacturing a deposition mask including two or more through holes, the method comprising:
 a first surface processing step of forming, in a first surface of a metal plate, a first concave portion including a first wall surface; and   a second surface etching step of etching a region of a second surface of the metal plate with an etchant and forming, in the second surface, a second concave portion including a second wall surface, the second surface being located opposite the first surface, the region being not covered with a second surface resist layer,   wherein   each of the through holes includes the first concave portion and the second concave portion, the second concave portion being connected to the first concave portion,   the second surface etching step is executed so that a flat region remains between two of the through holes adjacent to each other in a case where the deposition mask in seen from the second surface side,   the through holes are arrayed in a staggered arrangement in a first direction and a second direction in planar view,   the flat region includes, between two of the through holes adjacent to each other in the first direction, a first flat region located at a first side of a first center line and a second flat region located at a second side of the first center line,   the first center line passes through center points of two of the through holes adjacent to each other in the first direction,   the first flat region includes a portion in which a dimension of the first flat region in the first direction increases away from the first center line, and   the second flat region includes a portion in which a dimension of the second flat region in the first direction increases away from the first center line.   
     
     
         13 . The method according to  claim 12 , wherein the second surface etching step is executed so that the first flat region and the second flat region are contiguous to each other. 
     
     
         14 . The method according to  claim 12 , wherein the second surface etching step is executed so that the first flat region and the second flat region are noncontiguous to each other. 
     
     
         15 . The method according to  claim 12 , wherein the second surface etching step is executed so that in a case where the deposition mask is seen from the second surface side, two of the through holes adjacent to each other in the second direction are connected to each other. 
     
     
         16 . The method according to  claim 12 , wherein the second surface etching step is executed so that in a case where the deposition mask is seen from the second surface side, two of the through holes adjacent to each other in the second direction are not connected to each other. 
     
     
         17 . The method according to  claim 12 , wherein
 the second surface resist layer includes a first region corresponding to the first flat region and a second region corresponding to the second flat region,   the first region includes a portion in which a dimension of the first region in the first direction increases away from the first center line, and   the second region includes a portion in which a dimension of the second region in the first direction increases away from the first center line.   
     
     
         18 . The method according to  claim 12 , wherein the flat region exhibits a pixel value greater than or equal to a reference value in a case where the deposition mask is observed with a laser microscope from the second surface side. 
     
     
         19 . The method according to  claim 12 , wherein the metal plate has a thickness of 50 μm or less.