Atomizing core, atomizer, aerosol generating device and method for manufacturing atomizing core

Abstract

Provided are an atomizing core, an atomizer, an aerosol generating device and a method for manufacturing an atomizing core. The atomizing core includes a porous substrate, a heating layer, and electrodes. The surface of at least one side of the porous substrate is provided with an atomizing surface. By forming the electrodes on the porous substrate by using a thick film process, the heating layer is covered on the atomizing surface of the porous substrate, and there is no need to form the electrodes on the heating layer. Therefore, the electrodes may be firmly connected to the porous substrate, and the electrodes will also not be impacted by the high-temperature and high-speed fluid of the aerosol-forming substrate, so that the electrodes are not easy to fall off.

What is claimed is: 
     
         1 . An atomizing core comprising:
 a porous substrate having an atomizing surface for heating and atomizing an aerosol-forming substrate provided on the surface of at least one side of the porous substrate, wherein the porous substrate is a microporous structure for absorbing the aerosol-forming substrate and infiltrating the absorbed aerosol-forming substrate into the atomizing surface;   a heating layer covered on the atomizing surface, wherein the heating layer is a porous film layer with a microporous structure, the heating layer is configured for heating the aerosol-forming substrate on the atomizing surface to atomize the aerosol-forming substrate into smoke; and   electrodes provided on the surface of one side of the porous substrate having the atomizing surface and configured for electrically connecting the heating layer to a power supply device, wherein the electrodes are formed on the porous substrate through a thick film process, the heating layer is electrically connected to the electrodes.   
     
     
         2 . The atomizing core as claimed in  claim 1 , wherein the porous substrate is a porous ceramic member. 
     
     
         3 . The atomizing core as claimed in  claim 1 , wherein the heating layer is a platinum layer deposited on the atomizing surface. 
     
     
         4 . The atomizing core as claimed in  claim 1 , wherein a metal adhesion layer configured for combining the heating layer to the atomizing surface is provided between the atomizing surface and the heating layer, the metal adhesion layer is a porous film layer with a microporous structure. 
     
     
         5 . The atomizing core as claimed in  claim 4 , wherein the metal adhesion layer is a titanium layer deposited on the atomizing surface, the metal adhesion layer is deposited on the atomizing surface through a magnetron sputtering process. 
     
     
         6 . The atomizing core as claimed in  claim 5 , wherein the heating layer is deposited on one surface of the metal adhesion layer away from the atomizing surface through a magnetron sputtering process. 
     
     
         7 . The atomizing core as claimed in  claim 1 , wherein the heating layer comprises a right angle on the atomizing surface, and one side of the right angle coincides with the electrode. 
     
     
         8 . The atomizing core as claimed in  claim 1 , wherein the electrodes include two electrodes respectively located at two opposite ends of the heating layer, the electrodes are formed on the surface of one side of the porous substrate having the atomizing surface. 
     
     
         9 . The atomizing core as claimed in  claim 1 , wherein the electrodes are arranged in a pair and spaced apart, and the two electrodes respectively protrude from the surface of one side of the porous substrate, so that a recess is formed between the two electrodes, wherein the bottom surface of the recess forms the atomizing surface, and the atomizing surface is rectangular. 
     
     
         10 . An atomizer comprising the atomizing core as claimed in  claim 1 . 
     
     
         11 . An aerosol generating device comprising the atomizer as claimed in  claim 10 . 
     
     
         12 . A method for manufacturing an atomizing core, comprising the following steps:
 electrode production: a conductive slurry is enabled to flow into the microporous structure of a porous substrate through a thick film process, and the porous substrate with the conductive slurry is sintered at high temperature to form electrodes on the surface of one side of the porous substrate having an atomizing surface;   metal adhesion layer production: a first metal film is deposited on the atomizing surface of the porous substrate through a thin film process to form a metal adhesion layer on the atomizing surface of the porous substrate; and   heating layer production: a second metal film is deposited on the first metal film through a thick film process to form a heating layer that can be energized and generate heat on the atomizing surface of the porous substrate, the heating layer is electrically connected to the electrodes.   
     
     
         13 . The method for manufacturing an atomizing core as claimed in  claim 12 , wherein in the step of electrode production, an inflow depth of the conductive slurry is 10 μm to 100 μm. 
     
     
         14 . The method for manufacturing an atomizing core as claimed in  claim 12 , wherein in the step of electrode production, the porous substrate with the conductive slurry is sintered at a temperature of 450° C. to 850° C., the sintering time is controlled in the range of 5 minutes to 50 minutes. 
     
     
         15 . The method for manufacturing an atomizing core as claimed in  claim 12 , wherein in the step of metal adhesion layer production, the thickness of the first metal film is 0.005 μm to 0.1 μm. 
     
     
         16 . The method for manufacturing an atomizing core as claimed in  claim 12 , wherein in the step of heating layer production, the thickness of the second metal film is 0.2 μm to 1 μm.