Fabrication process for a/m/x materials
Abstract
The invention relates to a process for producing a crystalline A/M/X material, which crystalline A/M/X material comprises a compound of formula [A] a [M] b [X] c wherein: [A] comprises one or more A cations; [M] comprises one or more M cations which are metal or metalloid cations; [X] comprises one or more X anions; a is a number from 1 to 6; b is a number from 1 to 6; and c is a number from 1 to 18. The process is capable of producing crystalline A/M/X materials while precisely controlling their stoichiometry, leading to products with finely tunable optical properties such as peak emission wavelength. The invention also relates to process for producing a thin film comprising the crystalline A/M/X material of the invention, and to a thin film obtainable by the process of the invention. An optoelectronic device comprising the thin film is also provided.
Claims
exact text as granted — not AI-modified1 - 29 . (canceled)
30 . A process for producing a crystalline A/M/X material, which crystalline A/M/X material comprises a compound of formula:
wherein:
[A] comprises one or more A cations;
[M] comprises one or more M cations which are metal or metalloid cations;
[X] comprises one or more X anions;
a is a number from 1 to 6;
b is a number from 1 to 6; and
c is a number from 1 to 18,
the process comprising:
a) contacting an aqueous solution comprising an A precursor and an aqueous solvent with an organic solution comprising an M precursor and an organic solvent; and
b) allowing a precipitate to form when the said aqueous and organic solutions are contacted,
and wherein the process further comprises producing an optoelectronic device comprising the crystalline A/M/X material, wherein the optoelectronic device is a photovoltaic device.
31 . A process according to claim 30 which is a process for preparing a thin film of said crystalline A/M/X material, the process further comprising:
a) optionally washing the precipitate;
b) dissolving the precipitate in an organic solvent to form a film-forming solution; and
c) dispersing the film-forming solution on a substrate,
wherein said optoelectronic device comprises the thin film of the crystalline A/M/X material.
32 . A process according to claim 30 which is a process for preparing a thin film of said crystalline A/M/X material, the process further comprising:
c′) optionally washing the precipitate;
d′) vapourising the precipitate; and
e′) depositing the vapourised precipitate on a substrate,
wherein said optoelectronic device is an optoelectronic device comprising the thin film of said crystalline A/M/X material.
33 . A process according to claim 30 wherein said one or more A cations are monocations and said one or more M cations are dications.
34 . A process according to claim 30 wherein the compound of formula [A] a[ M] b[ X] c is a compound of formula [A][M][X] 3 .
35 . A process according to claim 30 wherein the compound of formula [A] a[ M] b[ X] c is a compound of formula [A] 2 [M][X] 6 .
36 . A process according to claim 30 wherein the crystalline A/M/X material comprises two or more compounds of formula [A] a [M] b [X] c .
37 . A process according to claim 30 wherein [A] comprises two or more different A cations.
38 . A process according to claim 37 wherein the process comprises, prior to step (a), preparing the aqueous solution by combining a solution of a first A precursor with a solution of a second A precursor, wherein:
the first A precursor comprises a first A cation; and
the second A precursor comprises a second A cation.
39 . A process according to claim 30 wherein [X] comprises two or more different X anions.
40 . A process according to claim 39 wherein the process comprises, prior to step (a), preparing the organic solution by combining a solution of a first M precursor with a solution of a second M precursor, wherein:
the first M precursor comprises a first X anion; and
the second M precursor comprises a second X anion.
41 . A process according to claim 30 wherein the organic solution comprises a hydrohalic acid.
42 . A process according to claim 30 wherein the organic solution comprises a hydrohalic acid of formula HX′, wherein X′ is one of the X anions.
43 . A process according to claim 30 wherein the relative molar amounts of each of said one or more A cations, said one or more M cations and said one or more X anions in the aqueous solution together with the organic solution are equal to the relative molar amounts of each of said one or more A cations, said one or more M cations and said one or more X anions in the compound of formula [A] a [M] b [X] c .
44 . A process according to claim 30 wherein each A cation is selected from an alkali metal cation, C 1-10 alkylamammonium, C 2-10 alkenylammonium, C 1-10 alkyliminium, C 3-10 cycloalkylamammonium and C 3-10 cycloalkyliminium optionally substituted with one or more substituents selected from amine, C 1-6 alkylamine, imine, C 1-6 alkylimine, C 1-6 alkyl, C 2-6 alkenyl,, C 3-6 cycloalkyl and C 6-12 aryl; preferably one or more of Cs + , Rb + , methylammonium, ethylammonium, propylammonium, butylammonium, pentylammoium, hexylammonium, septylammonium, octylammonium, and guanidinium.
45 . A process according to claim 30 wherein each A precursor is a halide salt of the A cation or one of the A cations.
46 . A process according to claim 30 wherein each metal or metalloid M cation is selected from Ca 2+ , Sr 2+ , Cd 2+ , Cu 2+ , Ni 2+ , Mn 2+ , Fe 2+ , Co 2+ , Pd 2+ , Ge 2+ , Sn 2+ , Pb 2+ , Yb 2+ and Eu 2+ , preferably Sn 2+ , Pb 2+ , Cu 2+ , Ge 2+ , and Ni 2+ ; particularly preferably Pb 2+ .
47 . A process according to claim 30 wherein each M precursor is a halide salt of the M cation or one of the M cations.
48 . A process according to claim 30 wherein each X anion is selected from F - , Cl - , Br- or I - , preferably Cl - or Br - .
49 . A process according to claim 30 wherein [A] a[ M] b[ X] c comprises at least two different A cations and at least two different X anions.
50 . A process according to claim 30 wherein [A] comprises Cs + and Rb + and wherein [X] comprises Br - and Cl - .
51 . A process according to claim 30 wherein said aqueous solvent comprises less than 20% by volume of organic solvents, preferably less than 10% by volume of organic solvents.
52 . A process according to claim 30 wherein the organic solvent in the organic solution comprises less than 20% by volume of water, preferably less than 10% by volume of water.
53 . A process according to claim 30 wherein the organic solvent in the organic solution comprises a polar organic solvent, preferably an organic solvent that is miscible with water, further preferably DMF.
54 . A process according to claim 30 wherein the organic solvent of step (d) comprises a polar solvent, preferably DMSO and/or DMF.
55 . A process according to claim 30 wherein step (e) comprises spin-coating the film-forming solution on the substrate.
56 . A process according to claim 30 wherein the process further comprises:
d) removing the organic solvent from the film-forming solution on the substrate,
preferably by evaporation, preferably at a temperature of 15 to 150° C., also preferably for at least 1 minute.
57 . A process according to claim 30 wherein the photovoltaic device is a solar cell.
58 . An optoelectronic device which is obtainable by or obtained by a process as defined in claim 30 , wherein the optoelectronic device is a photovoltaic device.
59 . An optoelectronic device according to claim 58 wherein the photovoltaic device is a solar cell.Join the waitlist — get patent alerts
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