Injection remediation systems and methods

Abstract

This invention relates generally to injection remediation systems and methods. In one embodiment, an injection remediation system includes, but is not limited to, at least one reservoir configured to contain material; at least one load sensor supporting the at least one reservoir; at least one dosing pump operably coupled to the at least one reservoir and configured to controllably source the material; and at least one processor configured to determine an amount of the material sourced from the at least one reservoir based at least partly on weight information obtained from the at least one load sensor.

1 . An injection remediation system comprising:
 at least one reservoir configured to contain remediation material;   at least one mixing tank configured to mix the remediation material with an injection fluid   at least one reservoir load sensor;   at least one mixing tank load sensor;   at least one dosing pump operably coupled to the at least one reservoir and configured to controllably source the remediation material to the at least one mixing tank; and   at least one processor configured to control the at least one dosing pump to provide a specified mass ratio of the remediation material relative to the injection fluid based at least partly on weight information obtained from the at least one reservoir load sensor and the at least one mixing tank load sensor.   
     
     
         2 . The injection remediation system of  claim 1 , further comprising:
 one or more plumbing lines connecting the at least one reservoir to the at least one mixing tank.   
     
     
         3 . The injection remediation system of  claim 1 , further comprising:
 at least one injection pump configured to pressurize the injection fluid.   
     
     
         4 . (canceled) 
     
     
         5 . The injection remediation system of  claim 1 , further comprising:
 at least one injection head configured to output the injection fluid.   
     
     
         6 . The injection remediation system of  claim 1 , wherein the at least one reservoir load sensor comprises:
 a plurality of reservoir load sensors supporting the at least one reservoir.   
     
     
         7 . The injection remediation system of  claim 1 , further comprising:
 at least one additional reservoir configured to contain different material;   at least one additional load sensor supporting the at least on additional reservoir; and   at least one additional dosing pump operably coupled to the at least one additional reservoir and configured to controllably source the different material to the at least one mixing tank,   wherein the at least one processor is configured to control the at least one additional dosing pump to provide a specified mass ratio of the different material relative to the injection fluid based at least partly on weight information obtained from the at least one additional load sensor and the at least one mixing tank load sensor.   
     
     
         8 . The injection remediation system of  claim 1 , wherein the injection remediation system is incorporated with vehicle. 
     
     
         9 . (canceled) 
     
     
         10 . The injection remediation system of  claim 1 , wherein the at least one processor is configured to determine a volume ratio involving the remediation material sourced from the at least one reservoir based at least partly on weight information obtained from the at least one reservoir load sensor. 
     
     
         11 . The injection remediation system of  claim 1 , wherein the at least one processor is configured to determine a mass ratio involving the remediation material sourced from the at least one reservoir based at least partly on weight information obtained from the at least one reservoir load sensor. 
     
     
         12 . The injection remediation system of  claim 1 , further comprising:
 a level sensor incorporated with the at least one reservoir,   wherein the at least one processor is configured to determine density information of the remediation material based at least partly on the weight information obtained from the at least one reservoir load sensor and volume information obtained using the level sensor, and control the at least one dosing pump based at least partly on the density information of the remediation material.   
     
     
         13 - 16 . (canceled) 
     
     
         17 . The system of  claim 1 , wherein the processor is configured to dynamically control the at least one dosing pump to account for volume drift. 
     
     
         18 - 19 . (canceled) 
     
     
         20 . The system of  claim 1 , wherein the processor is configured to control a speed of the at least one dosing pump. 
     
     
         21 . The system of  claim 1 , wherein the processor is configured to control a volume output from the at least one dosing pump. 
     
     
         22 . The system of  claim 1 , wherein the processor is configured to determine a variance from the specified mass ratio of the remediation material relative to the injection fluid, and adjust an output of the at least one dosing pump to reconcile the variance from the specified mass ratio. 
     
     
         23 . The system of  claim 1 , wherein the processor is configured to determine a variance from a specified volumetric ratio involving the remediation material, and adjust an output of the at least one dosing pump to reconcile the variance from the specified volumetric ratio. 
     
     
         24 . (canceled) 
     
     
         25 . (canceled) 
     
     
         26 . A vehicle injection remediation system comprising:
 a first reservoir configured to contain first remediation material, the first reservoir including a first load sensor and a first dosing pump for sourcing the first remediation material;   a second reservoir configured to contain second remediation material, the second reservoir including a second load sensor and a second dosing pump for sourcing the second remediation material;   a mixing tank coupled to the first doing pump and the second dosing pump and configured to mix the first remediation material and the second remediation material with an injection fluid;   and   at least one processor configured to control the first dosing pump and/or the second dosing pump to maintain a specified mass ratio between the first remediation material and the second remediation material based at least partly on weight information obtained from the first load sensor and the second load sensor.   
     
     
         27 . An adaptor for an injection remediation system comprising:
 a frame configured to support a reservoir for remediation material;   a plurality of load sensors positioned on the frame and configured to measure weight applied to the frame;   at least one processor configured to determine an amount of the remediation material sourced from the reservoir based at least partly on weight information obtained from the plurality of load sensors; and   at least one interface configured to communicate information associated with the amount of the material for controlling one or more dosing pumps to provide a specified mass ratio of the remediation material relative to an injection fluid.   
     
     
         28 . The injection remediation system of  claim 1 , wherein the processor is configured initialize the at least one dosing pump at a first pump rate, determine a measured mass ratio based at least partly on weight information obtained from the at least one reservoir load sensor, determine a variance between the specified mass ratio and the measured mass ratio at least partly using the weight information, and adjust the at least one dosing pump to a second pump rate based at least partly on the variance between the measured mass ratio and the specified mass ratio.