US2023417458A1PendingUtilityA1
Improved reagent for thermal machine
Est. expiryOct 22, 2040(~14.3 yrs left)· nominal 20-yr term from priority
F25B 17/08B01J 20/0222B01J 20/0288B01J 20/20B01J 20/28011B01J 20/28019B01J 20/28042B01J 20/3035B01J 20/3078Y02A30/27
49
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Claims
Abstract
The disclosed subject matter relates to a reactive matrix for the sorption/desorption of a heat transfer fluid (FG) in a reactor of a cold production device, this matrix comprising a compacted mixture of sorbent, of the manganese chloride monohydrate type, and expanded natural graphite in a preferred proportion of 79/21. The disclosed subject matter also relates to a method for manufacturing a wafer from this matrix and a reactor comprising a stack of such wafers.
Claims
exact text as granted — not AI-modified1 . A reactive matrix for the sorption/desorption of a heat transfer fluid (FG) in a reactor of a cold production device, wherein the matrix comprises a mixture of sorbent and expanded natural graphite (ENG).
2 . The matrix according to claim 1 , wherein the sorbent is a salt selected from manganese chloride, calcium chloride, barium chloride or nickel chloride.
3 . The matrix according to claim 1 , wherein the sorbent grain size is between 25 and 150 micrometers.
4 . The matrix according to claim 1 , wherein the matrix comprises a proportion of sorbent of between 76% and 87% of the mass of sorbent material, with the ENG forming substantially the rest of the complement.
5 . The matrix according to claim 1 , wherein the matrix is compacted such that the apparent mass of the ENG is between 80 kg/m 3 and 130 kg/m 3 .
6 . A reactive wafer consisting of a compact matrix according to claim 1 .
7 . The wafer according to claim 6 , wherein the wafter shape is cylindrical about an axis (X) and in that the wafter comprises a substantially coaxial interior passage.
8 . The wafer according to claim 7 , wherein:
the wafter has an outer diameter between 40 mm and 200 mm; the passage [ZP1] has a minimum diameter of between 17 mm and 23 mm; and, the wafter Chas a substantially constant axial thickness of between 40 mm and 50 mm.
9 . A method for manufacturing a wafer consisting of a compact matrix comprising a mixture of sorbent and expanded natural graphite (ENG), wherein the sorbent comprises manganese chloride hydrate, further comprising a prior drying to obtain a manganese chloride salt of water content less than 0.1 moles per mole of salt.
10 . The method according to claim 9 , further comprising mixing the manganese chloride monohydrate with the expanded natural graphite in chosen proportions and of compacting said mixture.
11 . A method for manufacturing a reactor, further comprising arranging one or more wafers manufactured according to claim 10 , in an envelope of the reactor.
12 . The method according to claim 11 , further comprising an additional drying by creating a vacuum in the envelope and by heating the envelope to a temperature close to 180° C., to extract water from the salt monohydrate.
13 . The method according to claim 9 , wherein the compacting further comprises using a piston, that is substantially cylindrical about a pistoning axis and which comprises a front surface, substantially flat and perpendicular to said pistoning axis, and a head which extends axially from said surface, said head comprising a substantially cylindrical distal part and a flared connection which connects said distal part to the front surface, said connection forming a quarter of a circle.Join the waitlist — get patent alerts
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