Reprocessing of contaminated reusable devices with direct contact of pressure waves

Abstract

Reusable instrumentation, such as a medical instrument or tool, is decontaminated by applying pressure waves from multiple shockwave applicators and/or reflectors.

What is claimed is: 
     
         1 . A system for disinfecting reusable instrumentation comprising:
 a first shockwave applicator including a first opening, wherein the first opening includes a cylindrical, L-shaped or U-shaped membrane, and wherein the first opening is configured to receive manual or automatic movement of the instrumentation through the first opening;   a second shockwave applicator including a second opening, wherein the second opening includes a cylindrical, L-shaped or U-shaped membrane, and the second opening is configured to receive manual or automatic movement of the instrumentation through the second opening; and   a liquid bath in which the first opening of the first shockwave applicator and second opening of the second shockwave applicator are linearly aligned for the instrumentation to simultaneously pass through the first opening and second opening.   
     
     
         2 . The system of  claim 1 , wherein the first shockwave applicator includes a full-ellipsoidal reflector. 
     
     
         3 . The system of  claim 1 , wherein the first shockwave applicator includes a semi-ellipsoidal reflector. 
     
     
         4 . The system of  claim 1 , wherein the first shockwave applicator includes a parabolic reflector. 
     
     
         5 . The system of  claim 1 , wherein the second shockwave applicator is identical to the first shock wave applicator and is rotated from 90° to 180° relative to the first shock wave applicator. 
     
     
         6 . The system of  claim 1 , wherein the first shockwave applicator produces unfocused shockwaves. 
     
     
         7 . The system of  claim 1 , wherein the first shockwave applicator produces focused shockwaves. 
     
     
         8 . The system of  claim 1 , wherein the first shockwave applicator includes a generator selected from the group consisting of hydraulic, piezoelectric, laser and electromagnetic. 
     
     
         9 . A system for disinfecting reusable instrumentation comprising a plurality of shockwave applicators linearly arranged within a liquid, wherein each shockwave applicator of the plurality includes an opening having a cylindrical, L-shaped or U-shaped membrane, and wherein each opening of a shockwave applicator is aligned with an opening of an adjacent shockwave applicator for the instrumentation to linearly move and pass through all openings of the plurality of shockwave applicators. 
     
     
         10 . The system of  claim 9  wherein at least one shockwave applicator of the plurality of shockwave applicators includes a full-ellipsoidal reflector. 
     
     
         11 . The system of  claim 9 , wherein at least one shockwave applicator of the plurality of shockwave applicators includes a semi-ellipsoidal reflector. 
     
     
         12 . The system of  claim 9 , wherein at least one shockwave applicator of the plurality of shockwave applicators includes a parabolic reflector. 
     
     
         13 . The system of  claim 9 , wherein at least two consecutive shockwave applicators of the plurality of shockwave applicators are rotated from 90° to 180° relative to one another. 
     
     
         14 . The system of  claim 9 , wherein at least one shockwave applicator of the plurality of shockwave applicators produces focused shockwaves. 
     
     
         15 . The system of  claim 9 , wherein at least one shockwave applicator of the plurality of shockwave applicators produces unfocused shockwaves. 
     
     
         16 . The system of  claim 9 , wherein at least one shockwave applicator of the plurality of shockwave applicators produces planar shockwaves. 
     
     
         17 . The system of  claim 9 , wherein one or more shockwave applicators of the plurality of shockwave applicators has a shockwave generator selected from the group consisting of an electrohydraulic generator, piezoelectric generator, electromagnetic generator, and laser generator. 
     
     
         18 . A method for cleaning reusable instrumentation comprising moving the reusable instrumentation through a plurality of openings in a plurality of shockwave applicators arranged linearly in a liquid bath. 
     
     
         19 . The method of  claim 18 , wherein each opening of each applicator of the plurality of shockwave applicators includes a cylindrical, L-shaped or U-shaped membrane. 
     
     
         20 . An apparatus for cleaning reusable instrumentation comprising:
 a first shockwave reflector with a first shockwave generator;   a platform with a top surface defining a top side of the platform and a bottom surface defining a bottom side of the platform wherein the first shockwave reflector and first shock wave generator are arranged on the top side of the platform;   a second shockwave reflector with a second shockwave generator arranged opposite the first shockwave reflect and first shockwave generator on the bottom side of the platform; and   liquid completely filling the first shockwave reflector and second shockwave reflector that submerges the platform.   
     
     
         21 . The apparatus of  claim 21 , wherein the first shockwave reflector and first shockwave generator produce focused shockwaves. 
     
     
         22 . The apparatus of  claim 22 , wherein the second shockwave reflector and second shockwave generator produce focused shockwaves. 
     
     
         23 . The apparatus of  claim 23 , further comprising reusable coiled instrumentation supported on the platform. 
     
     
         24 . The apparatus of  claim 22 , further comprising reusable coiled instrumentation supported on the platform. 
     
     
         25 . The apparatus of  claim 21 , further comprising reusable coiled instrumentation supported on the platform.