Systems and methods for treating a substrate
Abstract
Disclosed herein is a system for treating a magnesium or a magnesium alloy substrate comprising: a first pretreatment composition comprising a fluorometallic acid and free fluoride in an amount of 10 ppm to 500 ppm based on total weight of the first pretreatment composition and having a pH of 1.0 to 4.0; and a second pretreatment composition comprising a lanthanide series metal, the second pretreatment composition being substantially free of peroxide. Also disclosed are methods of treating a magnesium or magnesium alloy substrate. Treated magnesium and magnesium alloy substrates also are disclosed.
Claims
exact text as granted — not AI-modified1 . A system for treating a magnesium or a magnesium alloy substrate comprising:
a first pretreatment composition comprising a fluorometallic acid and free fluoride in an amount of 10 ppm to 500 ppm based on total weight of the first pretreatment composition and having a pH of 1.0 to 4.0; and a second pretreatment composition comprising a lanthanide series metal, the second pretreatment composition being substantially free, or essentially free, or completely free, of peroxide.
2 . The system of claim 1 , wherein the fluorometallic acid comprises a metal comprising a Group IIIA metal, a Group IVA metal, a Group IVB metal, and/or a Group VIII metal.
3 . (canceled)
4 . The system of claim 2 , wherein the fluorometallic acid comprises the metal in an amount of 10 ppm to 2,000 ppm based on total weight of the first pretreatment composition.
5 . The system of claim 1 , wherein the first pretreatment composition further comprises a hydroxide source and/or a fluoride source in addition to the fluorometallic acid.
6 - 7 . (canceled)
8 . The system of claim 1 , wherein the second pretreatment composition comprises the lanthanide series metal in an amount of 5 ppm to 25,000 ppm based on total weight of the second pretreatment composition.
9 . The system of claim 1 , wherein the second pretreatment composition further comprises a Group IIIA metal and/or a urea.
10 . The system of claim 9 , wherein the second pretreatment composition comprises the Group IIIA metal in an amount of 10 ppm to 500 ppm based on total weight of the second pretreatment composition and/or the urea in an amount of 20 ppm to 500 ppm based on total weight of the second pretreatment composition.
11 . The system of claim 1 , further comprising a cleaner composition.
12 - 13 . (canceled)
14 . The system of claim 1 , further comprising a film-forming composition.
15 . (canceled)
16 . A method of treating a magnesium or a magnesium alloy substrate comprising:
contacting at least a portion of a substrate surface with a first pretreatment composition comprising a fluorometallic acid and free fluoride in an amount of 10 ppm to 500 ppm based on total weight of the first pretreatment composition and having a pH of 1.0 to 4.0; and contacting at least a portion of the substrate surface with a second pretreatment composition comprising a lanthanide series metal and being substantially free, or essentially free, or completely free, of peroxide.
17 . The method of claim 16 , wherein the fluorometallic acid comprises a metal comprising a Group IIIA metal, a Group IVA metal, a Group IVB metal, and/or a Group VIII metal.
18 . The method of claim 16 , further comprising contacting at least a portion of the substrate surface with a cleaner composition prior to the contacting with one of the pretreatment compositions.
19 . The method of claim 16 , further comprising contacting at least a portion of the substrate surface with a coating composition comprising a film-forming resin following the contacting with the pretreatment compositions.
20 . The method of claim 16 , wherein the contacting with the second pretreatment composition comprises a spontaneous contacting.
21 . The method of claim 16 , wherein the contacting with the second pretreatment composition comprises passing an electric current between an anode and the substrate that has been contacted with the first pretreatment composition, serving as a cathode, said cathode and anode being immersed in the second composition.
22 . (canceled)
23 . A magnesium or magnesium alloy substrate treated with the system of claim 1 , wherein (a) at least 500 counts of a lanthanide series metal is present as measured by X-ray fluorescence (measured using an X-Met 755, Oxford Instruments; operating parameters 60 second timed assay, 15 Kv, 45 μA, Lα line, T(p)=1.1 μs); (b) at least 150 counts of aluminum as measured by X-ray fluorescence (measured using an X-Met 755, Oxford Instruments; operating parameters 60 second timed assay, 15 Kv, 45 μA, Kα line, T(p)=1.1 μs); (c) no more than 25 atomic % of a lanthanide series metal between an air/substrate interface and 1 m below the air/substrate interface as measured by an EDX line scan collected from a surface of the substrate to the bulk of the substrate in cross-section with a 5.00 kV accelerating voltage and a 3.0 spot size; and/or (d) no more than 65 atomic % of oxygen between the air/substrate interface and 1 m below the air/substrate interface as measured by an EDX line scan collected from a surface of the substrate to the bulk of the substrate in cross-section with a 5.00 kV accelerating voltage and a 3.0 spot size.
24 . (canceled)
25 . The substrate of claim 24 , comprising a first layer formed by the first pretreatment composition and/or a second layer formed by the second pretreatment.
26 - 28 . (canceled)
29 . The substrate of claim 23 , wherein the substrate comprises a vehicle, a part, an article, a heat exchanger, an appliance, a personal electronic device, a multi-metal article, or combinations thereof.
30 . The substrate of claim 29 , wherein the vehicle comprises an automobile or an aircraft.
31 . The substrate of claim 23 , wherein the substrate comprises a three-dimensional component formed by an additive manufacturing process.
32 . (canceled)Join the waitlist — get patent alerts
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