US2024328010A1PendingUtilityA1
Electrode for electrolytic processes and method for producing the same
Est. expiryMar 31, 2043(~16.7 yrs left)· nominal 20-yr term from priority
Inventors:Takashi Furusawa
C25B 11/093C25B 11/077C25B 11/052
75
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Claims
Abstract
An electrode for electrolytic processes, in particular to an anode suitable for oxygen evolution in an industrial electrolytic process and a method of manufacturing thereof. More specifically, MMO coated titanium anode for electrochemical reaction used for oxygen evolution reaction (OER) in various applications such as electrowinning, electroplating, electrogalvanizing and electrolytic copper-foil production, and methods for manufacturing the anode.
Claims
exact text as granted — not AI-modified1 . An electrode for electrolytic processes comprising:
a valve metal substrate comprising a coating, the coating comprising a catalytic layer and a barrier layer interposed between the catalytic layer and the substrate, the catalytic layer comprising a composition of metal oxides with a percent ratio of 17-42% Ta, 40-57% Ru, 19.5-26 Ir, and 0-9% Sn relative to the sum of Ta+Ru+Ir+Sn present in the catalytic layer, the barrier layer comprising a composition of metal oxides with a percent ratio of 25-40% Ta, 0-16% Ru, 0-9% Ir, and 44-55% Sn relative to the sum of Ta+Ru+Ir+Sn present in the barrier layer, wherein the coating is characterized by a diffusion area throughout in-between the barrier layer and the catalytic layer comprising oxides of metals that make up the barrier layer and the catalytic layer, the diffusion area comprising metal oxides with a percent ratio of 17-41% Ta, 17-39% Ru, 10-26% Ir and 14-37% Sn relative to the sum of Ta+Ru+Ir+Sn present in the diffusion area.
2 . The electrode according to claim 1 , wherein
the catalytic layer comprises the percent ratio of 17-21% Ta, 50-57% of Ru, 22-26% Ir and 2-7% of Sn relative to the sum of Ta+Ru+Ir+Sn present in the catalytic layer, the barrier layer comprises the percent ratio of 34-40% Ta, 7-16% Ru, 4-9% Ir and 44-46% Sn relative to the sum of Ta+Ru+Ir+Sn present in the barrier layer, and the diffusion area comprises the percent ratio of 21-34% Ta, 22-39% Ru, 12-26% Ir and about 14-31% Sn relative to the sum of Ta+Ru+Ir+Sn present in the diffusion area.
3 . The electrode according to claim 1 , wherein the composition of metal oxides in the catalytic layer comprises the percent ratio of:
Ta At %
Ru At %
Ir At %
Sn At %
18%
57%
24%
2%
21%
56%
22%
2%
17%
56%
26%
2%
18%
50%
25%
7%
relative to the sum of Ta+Ru+Ir+Sn present in the catalytic layer.
4 . The electrode according to claim 1 , wherein the composition of metal oxides in the barrier layer comprises the percent ratio of:
Ta At %
Ru At %
Ir At %
Sn At %
37%
16%
4%
44%
34%
13%
9%
45%
40%
7%
7%
46%
relative to the sum of Ta+Ru+Ir+Sn present in the barrier layer.
5 . The electrode according to claim 1 , wherein the composition of metal oxides in the diffusion area comprises the percent ratio of:
Ta At %
Ru At %
Ir At %
Sn At %
21%
39%
26%
14%
33%
29%
12%
26%
34%
22%
14%
31%
relative to the sum of Ta+Ru+Ir+Sn present in the diffusion area.
6 . The electrode according to claim 1 , wherein the valve metal substrate is niobium, zirconium, titanium or alloyed titanium.
7 . The electrode according to claim 1 , wherein the roughness surface of the substrate is 2.0 to 10.0 μm in terms of the arithmetic average of the roughness profile (Ra).
8 . The electrode according to claim 1 , wherein the catalytic coating loading is 2.0 to 20.0 g/m 2 in terms of total precious metals iridium and ruthenium.
9 . The electrode according to claim 1 , wherein the barrier layer coating loading is 1.0 to 13.0 g/m 2 in terms of tin and tantalum.
10 . A method for manufacturing an electrode for electrolytic processes comprising:
a. optionally, pre-treating a valve metal substrate to obtain a pre-treated substrate with a surface roughness of the substrate in the range of 2.0 to 10.0 μm in terms of the arithmetic average of the roughness profile (Ra); b. mixing stannic hydroxyacetochloride (SnHAC) complex solution, tantalum solution and aqueous solution of 10 wt % acetic acid to obtain a Sn—Ta barrier layer solution; c. preparing a precursor solution of Ru, Ir and Ta to obtain a catalytic coating solution of Ir—Ru—Ta; d. applying the Sn—Ta barrier layer solution from step b) to the optionally pre-treated substrate, followed by drying, thermal decomposition treatment and cooling down to obtain a Sn—Ta barrier layer coated substrate; e. optionally repeating step d) until reaching an overall loading of 1.0-13.0 g/m 2 in terms of Sn and Ta metals in the coated substrate; f. applying the catalytic coating solution from step c) to the Sn—Ta barrier layer coated substrate, followed by drying, thermal decomposition treatment and cool down; g. optionally repeating step f) until reaching an overall loading of the catalytic coating of 2.0 to 20.0 g/m 2 in terms of total precious metals Ir and Ru.
11 . The method according to claim 10 , wherein the catalytic coating solution comprises 18-21 mol % iridium, 52-64 mol % ruthenium and 15-30 mol % tantalum.
12 . The method according to claim 10 , wherein the barrier layer solution comprises oxides of tin and tantalum in a ratio of 70-90:30-10 mol % Sn:Ta.
13 . The method according to claim 10 , wherein in step a) the pre-treating step is carried out first by sandblasting by alumina grit, followed by blasting with steel grit and then etching in aqueous solution of 20 wt % hydrochloric acid at boiling temperature for 20 minutes; after the etching, rinsing the substrate with deionized water and drying.
14 . The method according to claim 10 , wherein in step b) the Sn—Ta barrier layer solution is obtained by mixing 1.65 M of stannic hydroxyacetochloride (SnHAC) complex solution, 120 g/L of tantalum solution and aqueous solution of 10 wt % acetic acid.
15 . The method according to claim 10 , wherein in step c) the Ru precursor for the catalytic coating solution is RuCl 3 or RuHAC, Ir precursor is IrCl 3 , H 2 IrCl 6 or IrHAC, and Ta precursor is TaCl 5 .
16 . The method according to claim 10 , wherein in step c) the precursor solution of Ru, Ir and Ta is obtained by mixing H 2 IrCl 6 solution, 20 wt % RuCl 3 solution, 120 g/L of tantalum solution and 10 wt % HCl.
17 . The method according to claim 10 , wherein in steps d) and f) the drying temperature can be from 25° C. to 60° C.
18 . The method according to claim 10 , wherein in steps d) and f) the thermal decomposition treatment is carried out in an electric furnace, at a temperature range of 480-530° C. for 10 to 20 minutes.
19 . An electrode obtained by a method comprising applying a barrier layer solution comprising oxides of tin and tantalum in a ratio of 70-90:30-10 mol % Sn:Ta to a valve metal substrate, followed by drying, thermal decomposition treatment and cooling down; thereafter applying a catalytic coating solution comprising 18-21 mol % iridium, 52-64 mol % ruthenium and 15-30 mol % tantalum to the barrier layer, followed by drying, thermal decomposition treatment and cooling down, wherein the electrode comprises a coating comprising a catalytic layer and a barrier layer interposed between the catalytic layer and the substrate.Join the waitlist — get patent alerts
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