US2024328010A1PendingUtilityA1

Electrode for electrolytic processes and method for producing the same

Assignee: INDUSTRIE DE NORA SPAPriority: Mar 31, 2023Filed: Feb 29, 2024Published: Oct 3, 2024
Est. expiryMar 31, 2043(~16.7 yrs left)· nominal 20-yr term from priority
C25B 11/093C25B 11/077C25B 11/052
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Claims

Abstract

An electrode for electrolytic processes, in particular to an anode suitable for oxygen evolution in an industrial electrolytic process and a method of manufacturing thereof. More specifically, MMO coated titanium anode for electrochemical reaction used for oxygen evolution reaction (OER) in various applications such as electrowinning, electroplating, electrogalvanizing and electrolytic copper-foil production, and methods for manufacturing the anode.

Claims

exact text as granted — not AI-modified
1 . An electrode for electrolytic processes comprising:
 a valve metal substrate comprising a coating, the coating comprising a catalytic layer and a barrier layer interposed between the catalytic layer and the substrate,   the catalytic layer comprising a composition of metal oxides with a percent ratio of 17-42% Ta, 40-57% Ru, 19.5-26 Ir, and 0-9% Sn relative to the sum of Ta+Ru+Ir+Sn present in the catalytic layer,   the barrier layer comprising a composition of metal oxides with a percent ratio of 25-40% Ta, 0-16% Ru, 0-9% Ir, and 44-55% Sn relative to the sum of Ta+Ru+Ir+Sn present in the barrier layer,   wherein the coating is characterized by a diffusion area throughout in-between the barrier layer and the catalytic layer comprising oxides of metals that make up the barrier layer and the catalytic layer, the diffusion area comprising metal oxides with a percent ratio of 17-41% Ta, 17-39% Ru, 10-26% Ir and 14-37% Sn relative to the sum of Ta+Ru+Ir+Sn present in the diffusion area.   
     
     
         2 . The electrode according to  claim 1 , wherein
 the catalytic layer comprises the percent ratio of 17-21% Ta, 50-57% of Ru, 22-26% Ir and 2-7% of Sn relative to the sum of Ta+Ru+Ir+Sn present in the catalytic layer,   the barrier layer comprises the percent ratio of 34-40% Ta, 7-16% Ru, 4-9% Ir and 44-46% Sn relative to the sum of Ta+Ru+Ir+Sn present in the barrier layer, and   the diffusion area comprises the percent ratio of 21-34% Ta, 22-39% Ru, 12-26% Ir and about 14-31% Sn relative to the sum of Ta+Ru+Ir+Sn present in the diffusion area.   
     
     
         3 . The electrode according to  claim 1 , wherein the composition of metal oxides in the catalytic layer comprises the percent ratio of: 
       
         
           
                 
                 
                 
                 
                 
               
                     
                     
                 
                     
                   Ta At % 
                   Ru At % 
                   Ir At % 
                   Sn At % 
                 
                     
                     
                 
                     
                   18% 
                   57% 
                   24% 
                   2% 
                 
                     
                   21% 
                   56% 
                   22% 
                   2% 
                 
                     
                   17% 
                   56% 
                   26% 
                   2% 
                 
                     
                   18% 
                   50% 
                   25% 
                   7% 
                 
                     
                     
                 
             
                
                
                
               
               
                
                
                
                
                
               
            
           
         
         relative to the sum of Ta+Ru+Ir+Sn present in the catalytic layer. 
       
     
     
         4 . The electrode according to  claim 1 , wherein the composition of metal oxides in the barrier layer comprises the percent ratio of: 
       
         
           
                 
                 
                 
                 
                 
               
                     
                     
                 
                     
                   Ta At % 
                   Ru At % 
                   Ir At % 
                   Sn At % 
                 
                     
                     
                 
                     
                   37% 
                   16% 
                   4% 
                   44% 
                 
                     
                   34% 
                   13% 
                   9% 
                   45% 
                 
                     
                   40% 
                    7% 
                   7% 
                   46% 
                 
                     
                     
                 
             
                
                
                
               
               
                
                
                
                
               
            
           
         
         relative to the sum of Ta+Ru+Ir+Sn present in the barrier layer. 
       
     
     
         5 . The electrode according to  claim 1 , wherein the composition of metal oxides in the diffusion area comprises the percent ratio of: 
       
         
           
                 
                 
                 
                 
                 
               
                     
                     
                 
                     
                   Ta At % 
                   Ru At % 
                   Ir At % 
                   Sn At % 
                 
                     
                     
                 
                     
                   21% 
                   39% 
                   26% 
                   14% 
                 
                     
                   33% 
                   29% 
                   12% 
                   26% 
                 
                     
                   34% 
                   22% 
                   14% 
                   31% 
                 
                     
                     
                 
             
                
                
                
               
               
                
                
                
                
               
            
           
         
         relative to the sum of Ta+Ru+Ir+Sn present in the diffusion area. 
       
     
     
         6 . The electrode according to  claim 1 , wherein the valve metal substrate is niobium, zirconium, titanium or alloyed titanium. 
     
     
         7 . The electrode according to  claim 1 , wherein the roughness surface of the substrate is 2.0 to 10.0 μm in terms of the arithmetic average of the roughness profile (Ra). 
     
     
         8 . The electrode according to  claim 1 , wherein the catalytic coating loading is 2.0 to 20.0 g/m 2  in terms of total precious metals iridium and ruthenium. 
     
     
         9 . The electrode according to  claim 1 , wherein the barrier layer coating loading is 1.0 to 13.0 g/m 2  in terms of tin and tantalum. 
     
     
         10 . A method for manufacturing an electrode for electrolytic processes comprising:
 a. optionally, pre-treating a valve metal substrate to obtain a pre-treated substrate with a surface roughness of the substrate in the range of 2.0 to 10.0 μm in terms of the arithmetic average of the roughness profile (Ra);   b. mixing stannic hydroxyacetochloride (SnHAC) complex solution, tantalum solution and aqueous solution of 10 wt % acetic acid to obtain a Sn—Ta barrier layer solution;   c. preparing a precursor solution of Ru, Ir and Ta to obtain a catalytic coating solution of Ir—Ru—Ta;   d. applying the Sn—Ta barrier layer solution from step b) to the optionally pre-treated substrate, followed by drying, thermal decomposition treatment and cooling down to obtain a Sn—Ta barrier layer coated substrate;   e. optionally repeating step d) until reaching an overall loading of 1.0-13.0 g/m 2  in terms of Sn and Ta metals in the coated substrate;   f. applying the catalytic coating solution from step c) to the Sn—Ta barrier layer coated substrate, followed by drying, thermal decomposition treatment and cool down;   g. optionally repeating step f) until reaching an overall loading of the catalytic coating of 2.0 to 20.0 g/m 2  in terms of total precious metals Ir and Ru.   
     
     
         11 . The method according to  claim 10 , wherein the catalytic coating solution comprises 18-21 mol % iridium, 52-64 mol % ruthenium and 15-30 mol % tantalum. 
     
     
         12 . The method according to  claim 10 , wherein the barrier layer solution comprises oxides of tin and tantalum in a ratio of 70-90:30-10 mol % Sn:Ta. 
     
     
         13 . The method according to  claim 10 , wherein in step a) the pre-treating step is carried out first by sandblasting by alumina grit, followed by blasting with steel grit and then etching in aqueous solution of 20 wt % hydrochloric acid at boiling temperature for 20 minutes; after the etching, rinsing the substrate with deionized water and drying. 
     
     
         14 . The method according to  claim 10 , wherein in step b) the Sn—Ta barrier layer solution is obtained by mixing 1.65 M of stannic hydroxyacetochloride (SnHAC) complex solution, 120 g/L of tantalum solution and aqueous solution of 10 wt % acetic acid. 
     
     
         15 . The method according to  claim 10 , wherein in step c) the Ru precursor for the catalytic coating solution is RuCl 3  or RuHAC, Ir precursor is IrCl 3 , H 2 IrCl 6  or IrHAC, and Ta precursor is TaCl 5 . 
     
     
         16 . The method according to  claim 10 , wherein in step c) the precursor solution of Ru, Ir and Ta is obtained by mixing H 2 IrCl 6  solution, 20 wt % RuCl 3  solution, 120 g/L of tantalum solution and 10 wt % HCl. 
     
     
         17 . The method according to  claim 10 , wherein in steps d) and f) the drying temperature can be from 25° C. to 60° C. 
     
     
         18 . The method according to  claim 10 , wherein in steps d) and f) the thermal decomposition treatment is carried out in an electric furnace, at a temperature range of 480-530° C. for 10 to 20 minutes. 
     
     
         19 . An electrode obtained by a method comprising applying a barrier layer solution comprising oxides of tin and tantalum in a ratio of 70-90:30-10 mol % Sn:Ta to a valve metal substrate, followed by drying, thermal decomposition treatment and cooling down; thereafter applying a catalytic coating solution comprising 18-21 mol % iridium, 52-64 mol % ruthenium and 15-30 mol % tantalum to the barrier layer, followed by drying, thermal decomposition treatment and cooling down, wherein the electrode comprises a coating comprising a catalytic layer and a barrier layer interposed between the catalytic layer and the substrate.

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