Cmp conditioning disc and method of manufacturing the cmp conditioning disc

Abstract

A method of manufacturing a CMP conditioning disc, includes: a primary forming layer forming step of forming a primary forming layer on an outer surface of a shank base and arranging a plurality of diamonds on the primary forming layer; and a secondary forming layer forming step of forming a secondary forming layer on an upper surface of the primary forming layer and exposing at least a portion of the diamonds in the secondary forming layer.

What is claimed is: 
     
         1 . A method for manufacturing a CMP (chemical mechanical polishing) conditioning disc, comprising:
 forming a primary forming layer on an outer surface of a shank base;   and arranging a plurality of diamonds on the primary forming layer; and   forming a secondary forming layer on an upper surface of the primary forming layer;   and exposing at least a portion of the diamonds in the secondary forming layer.   
     
     
         2 . The method of  claim 1 , wherein in the forming the primary forming layer, the primary forming layer is formed through a brazing process or sintering process, and
 in the forming the secondary forming layer, the secondary forming layer is formed through the brazing process.   
     
     
         3 . The method of  claim 1 , wherein in the forming the primary forming layer,
 a primary metal powder layer is provided and pre-sintered on the outer surface of the shank base,   an adhesive layer is formed on an outer surface of the primary metal powder layer and   the diamonds are temporarily fixed to an outer surface of the adhesive layer.   
     
     
         4 . The method of  claim 3 , wherein in the fixing the diamonds temporarily, the plurality of diamonds are fixed to the primary forming layer in such a way that the diamonds maintain an upright posture extending downward from a top of a long axis. 
     
     
         5 . The method of  claim 4 , wherein in the fixing the diamonds temporarily, the plurality of diamonds are held temporarily in a regular pattern in rows and columns on a suction pressure device, and the plurality of diamonds are pressed and fixed on the primary forming layer using the suction pressure device to maintain the upright posture of the plurality of diamonds. 
     
     
         6 . The method of  claim 1 , wherein in the forming the secondary forming layer,
 a secondary metal powder layer is pre-sintered on the outer surface of the primary forming layer to form a secondary forming layer, and   the secondary forming layer is dry polished to cover all of the diamonds or to expose at least a portion of the diamonds.   
     
     
         7 . The method of  claim 6 , wherein in the forming the secondary forming layer,
 the diamonds are fixed completely in the secondary forming layer through shrinkage of the dry polished secondary forming layer.   
     
     
         8 . A CMP conditioning disc comprising:
 a shank base;   a primary forming layer formed on an outer surface of the shank base;   a secondary forming layer formed on an outer surface of the primary forming layer; and   a plurality of diamonds arranged in the primary forming layer and the secondary forming layer, at least a portion of the diamonds being exposed from the secondary forming layer.   
     
     
         9 . The CMP conditioning disc of  claim 8 , wherein the plurality of diamonds are arranged in rows and columns to be spaced apart from each other in an outer surface of the secondary forming layer, and exposed to have the same exposure height from the outer surface of the secondary forming layer. 
     
     
         10 . The CMP conditioning disc of  claim 8 , wherein the primary forming layer is formed at a melting point that is the same as, lower than, or higher than that of the secondary forming layer. 
     
     
         11 . The CMP conditioning disc of  claim 8 , wherein a thickness between the outer surface of the primary forming layer and an outer surface of the secondary forming layer is larger than a thickness between the outer surface of the primary forming layer and the outer surface of the shank base. 
     
     
         12 . A CMP conditioning disc manufactured by the method set forth in  claim 1 .