Apparatus for the enhancement of non-metallic particle removal from liquid metal flowing through a vessel

Abstract

A purifying device for removing impurities from liquid metal present in a vessel includes a baffle including a first surface and a second surface disposed opposite the first surface. A vent channel is formed between the first surface and the second surface, the vent channel having a proximal end and a distal end opposite the proximal end, the vent channel configured to receive a stream of gas at the proximal end and vent at least some of the stream of gas at the distal end. At least one first vent hole is arranged on the first surface and extending into the vent channel, and at least one second vent hole arranged on the second surface and extending into the vent channel. A passage for liquid metal flow is disposed within the baffle, the passage having a proximal surface and a distal surface, where the distal surface is disposed adjacent to the proximal end of the vent channel.

1 . A purifying device for removing impurities from liquid metal present in a vessel, comprising:
 a baffle including a first surface and a second surface disposed opposite the first surface;   a vent channel formed between the first surface and the second surface, the vent channel having a proximal end and a distal end opposite the proximal end, the vent channel configured to receive a stream of gas at the proximal end and vent at least some of the stream of gas at the distal end;   at least one first vent hole, arranged on one of the first surface or the second surface, the at least one first vent hole extending into the vent channel; and   a passage for liquid metal flow, the passage having a proximal surface and a distal surface, where the distal surface is disposed adjacent to the proximal end of the vent channel.   
     
     
         2 . The purifying device according to  claim 1 , wherein the baffle further comprises a gas supply channel including an input port for receiving a gas, an output port for outputting the gas, and conduit connecting the input port to the output port, wherein the output port is disposed at the proximal surface of the passage. 
     
     
         3 . The purifying device according to  claim 1 , further comprising a porous element disposed at the proximal surface of the passage. 
     
     
         4 . The purifying device according to  claim 3 , wherein the porous element is fluidically coupled to the output port of the gas channel. 
     
     
         5 . The purifying device according to  claim 3 , wherein the porous element spans an entire width of the passage. 
     
     
         6 . The purifying device according to  claim 1 , further comprising at least one second vent hole arranged opposite the at least one first vent hole on the other of the first surface or the second surface. 
     
     
         7 . The purifying device according to  claim 1 , wherein the distal end of the vent channel opens to the ambient environment above a free surface of the liquid metal. 
     
     
         8 . The purifying device according to  claim 1 , wherein the at least one first vent hole comprises a plurality of first vent holes, and the at least one second vent hole comprises a plurality of second vent holes, wherein the plurality of first vent holes are arranged along a first plane and the plurality of second vent holes are arranged along a second plane. 
     
     
         9 . The purifying device according to  claim 1 , further comprising a divider wall arranged within the vent channel, the divider wall splitting the vent channel into two separate channels. 
     
     
         10 . The purifying device according to  claim 9 , wherein the dividing wall spans between the proximal end and the distal end of the vent channel. 
     
     
         11 . The purifying device according to  claim 1 , wherein the passage for liquid metal flow spans an entire width of the proximal end of the vent channel. 
     
     
         12 . A tundish, comprising:
 a floor;   a wall attached to the floor, wherein the wall and the floor define a container;   the purifying device according to  claim 1  arranged with the container.   
     
     
         13 . The tundish according to  claim 12 , wherein the wall comprises a first side wall and a second sidewall arranged opposite the first sidewall, the first and second sidewalls attached to the floor; and
 a first end wall and a second end wall arranged opposite the first end wall, the first end wall and second end wall attached to the floor and to respective ends of the first and second sidewalls to define a container.   
     
     
         14 . The tundish according to  claim 12 , further comprising:
 an inlet for receiving liquid metal into the tundish; and   an outlet for dispensing liquid metal from the tundish, wherein the purifying device is disposed between the inlet and outlet.   
     
     
         15 . The tundish according to  claim 12 , wherein the tundish has a predetermined maximum level for liquid metal, and the distal end of the vent channel extends above the predetermined maximum level for liquid metal. 
     
     
         16 . The tundish according to  claim 12 , wherein the purifying device spans an entire width of the container between a floor of the container and a maximum liquid metal level of the container. 
     
     
         17 . A method for removing impurities from liquid metal present in a vessel, the liquid metal covered by a top layer floating on a free surface of the liquid metal, the vessel including a baffle defining a first vessel section and a second vessel section, the baffle having a passage for liquid metal flow arranged proximate to a floor of the vessel and fluidically coupling the first vessel section to the second vessel section, the method comprising:
 subjecting liquid metal flowing within the passage to a stream of gas;   receiving at least some of the stream of gas and a portion of the liquid metal flowing within the passage at a vent channel disposed within the baffle, the vent channel guiding gas and liquid metal toward the top layer,   expelling the liquid metal received by the vent channel out of the vent channel prior to the liquid metal reaching the top layer; and   venting the gas received by the vent channel out of the vent channel.   
     
     
         18 . The method according to  claim 17 , wherein the top layer comprises of at least one of flux or slag. 
     
     
         19 . The method according to  claim 17 , wherein venting comprises guiding the stream of gas through a portion of the top layer that is constrained within the vent channel. 
     
     
         20 . The method according to  claim 17 , wherein receiving comprises using a vent channel having a first vent section and a second vent section adjacent to and isolated from the first vent section. 
     
     
         21 . The method according to  claim 17 , wherein expelling comprises laterally expelling the liquid metal from the vent channel. 
     
     
         22 . The method according to  claim 17 , wherein expelling further comprises creating a clockwise flow of liquid metal in the second vessel section, the clockwise flow beginning at the floor adjacent to the passage for liquid metal flow, moving adjacent to the baffle and toward the top layer, and then returning toward the floor. 
     
     
         23 . The method according to  claim 17 , wherein venting the gas received by the vent channel out of the vent channel comprises venting the gas over the top layer.