Electrode, and Use and Preparation Method Thereof

Abstract

An electrode, and use and a preparation method thereof. The electrode includes a metal substrate and a catalytic layer. The electrode includes at least one of the following features: i) the substrate is a corrosion inhibitor-containing titanium alloy, the corrosion inhibitor being selected from at least one metal of platinum, palladium, osmium, iridium, ruthenium, rhodium, tantalum, zirconium and niobium, and the content of the corrosion inhibitor being 0.05 wt %-0.5 wt % of the total mass of the alloy; ii) the catalytic layer is an iridium oxide layer or an iridium-tantalum mixed oxide layer, with a mass ratio of iridium element to tantalum element being 1:4 to 1:0; and iii) an interlayer is disposed between the substrate and the catalytic layer, the interlayer being a titanium-tantalum alloy layer. For the electrode, its corrosion resistance is greatly improved, its lifetime is extended, and its production cost is reduced.

1 . An electrode, comprising a metal substrate and a catalytic layer;
 wherein the electrode includes at least one of the following features:   i) the substrate is a corrosion inhibitor-containing titanium alloy, the corrosion inhibitor being selected from at least one metal of platinum, palladium, osmium, iridium, ruthenium, rhodium, tantalum, zirconium and niobium, and the content of the corrosion inhibitor being 0.05 wt %-0.5 wt % of the total mass of the alloy;   ii) the catalytic layer is an iridium oxide layer or an iridium-tantalum mixed oxide layer, with a mass ratio of iridium element to tantalum element being 1:4 to 1:0; and   iii) an interlayer is disposed between the substrate and the catalytic layer, the interlayer being a titanium-tantalum alloy layer.   
     
     
         2 . An electrode as claimed in  claim 1 , wherein the corrosion inhibitor is selected from ruthenium and/or palladium. 
     
     
         3 . An electrode as claimed in  claim 2 , wherein the corrosion inhibitor is palladium. 
     
     
         4 . An electrode as claimed in  any preceding claim , wherein the content of the corrosion inhibitor is 0.12 wt %-0.25 wt % of the total mass of the alloy. 
     
     
         5 . An electrode as claimed in any one of  claims 2 to 4 , wherein the corrosion inhibitor-containing titanium alloy further comprises one or more of the following elements: H, N, C, O and Fe. 
     
     
         6 . An electrode as claimed in  claim 5 , wherein the corrosion inhibitor-containing titanium alloy comprises 0.015 wt % of H, 0.03 wt % of N, 0.08 wt % of C, 0.18 wt % of O, 0.020 wt % of Fe, 0.05 wt %-0.5 wt % of corrosion inhibitor, and the balance of Ti, based on the total mass of the alloy. 
     
     
         7 . An electrode as claimed in  any preceding claim , wherein the electrode further comprises a catalytic base layer, the catalytic base layer being located between the substrate and the catalytic layer or between the interlayer and the catalytic layer, and comprising a tantalum oxide layer. 
     
     
         8 . An electrode as claimed in  claim 7 , wherein a loading amount of tantalum in the tantalum oxide layer is 1 g/m 2 -3 g/m 2 . 
     
     
         9 . An electrode as claimed in  claim 7 , wherein the loading amount of tantalum in the tantalum oxide layer is 3 g/m 2 . 
     
     
         10 . An electrode as claimed in  any preceding claim , wherein the interlayer comprises, based on the total mass of the interlayer, 40 wt %-60 wt % of titanium and 40 wt %-60 wt % of tantalum. 
     
     
         11 . An electrode as claimed in  claim 10 , wherein the interlayer comprises 60wt % of titanium and 40 wt % of tantalum. 
     
     
         12 . An electrode as claimed in  any preceding claim , wherein a loading amount of iridium in the catalytic layer is 2 g/m 2 -20 g/m 2 . 
     
     
         13 . An electrode as claimed in any one of  claims 1 to 11 , wherein the loading amount of iridium in the catalytic layer is 2 g/m 2 -10 g/m 2 . 
     
     
         14 . An electrode as claimed in any one of  claims 1 to 11 , wherein the loading amount of iridium in the catalytic layer is 5 g/m 2 . 
     
     
         15 . Use of an electrode according to any one of  claims 1 to 14 , the electrode being used for electrowinning, electrolytic synthesis, metal plating, metal foil manufacturing or printed circuit board manufacturing. 
     
     
         16 . The use of an electrode according to  claim 15 , comprising electrowinning, electrolytic synthesis, metal plating, metal foil manufacturing or printed circuit board manufacturing for metal nickel, copper, cobalt, zinc, silver, gold or manganese. 
     
     
         17 . Use of an electrode according to any one of  claims 1 to 14 , the electrode being used as an insoluble anode for electrowinning. 
     
     
         18 . A method for preparing an electrode according to any one of  claims 1 to 14 , comprising:
 providing an electrode substrate; and   forming a catalytic layer, preferably by a paint-thermal decomposition method or a plasma spraying method.   
     
     
         19 . The method for preparing an electrode according to  claim 18 , further comprising forming an interlayer on the substrate prior to the forming a catalytic layer. 
     
     
         20 . The method for preparing an electrode according to  claim 19 , wherein the interlayer on the substrate is formed by a chemical vapor deposition method or a physical vapor deposition method. 
     
     
         21 . The method according to any one of  claims 18 to 20 , wherein the catalytic layer is formed by providing an iridium-containing, or an iridium and tantalum-containing coating solution, to coat a surface of the substrate or a surface of the interlayer, drying and sintering. 
     
     
         22 . The method according to any one of  claims 19 to 21 , wherein the interlayer is formed by a magnetron sputtering method. 
     
     
         23 . The method according to any one of  claims 19 to 22 , further comprising forming a catalytic base layer on the substrate or on the interlayer, prior to the forming the catalytic layer. 
     
     
         24 . The method according to  claim 23 , wherein forming the catalytic base layer is by a paint-thermal decomposition method or a plasma spraying method.