Continuous production system

Abstract

A continuous production system according to an aspect of the present disclosure includes a continuous reactor, a supply path connected to the continuous reactor, a guide path connected to the continuous reactor, a measuring apparatus configured to acquire information on a substance moving in the continuous reactor or in the guide path, and a controller configured to perform control based on the information. The information is electric impedance of the substance or a property of the substance, the property being derived from the electric impedance.

1 . A continuous production system comprising:
 a continuous reactor;   a supply path connected to the continuous reactor;   a guide path connected to the continuous reactor;   a measuring apparatus configured to acquire information on a substance moving in the continuous reactor or in the guide path; and   a controller configured to perform control based on the information,   the information being electric impedance of the substance or a property of the substance, the property being derived from the electric impedance.   
     
     
         2 . The continuous production system of  claim 1 , wherein
 the property is at least one selected from the group consisting of: a phase shift between a current and a voltage; electrical conductivity; permittivity; complex electrical conductivity; complex permittivity; a permittivity spectrum; a dielectric relaxation frequency; and a characteristic value calculated from at least one selected from the group consisting of the electric impedance, the phase shift, the electrical conductivity, the permittivity, the complex electrical conductivity, the complex permittivity, the permittivity spectrum, and the dielectric relaxation frequency.   
     
     
         3 . The continuous production system of  claim 1 , wherein
 the measuring apparatus is configured to acquire the information as a tomographic image.   
     
     
         4 . The continuous production system of  claim 1 , further comprising a temperature adjusting mechanism configured to adjust a temperature of the continuous reactor, wherein
 the control by the controller includes controlling operation of the temperature adjusting mechanism.   
     
     
         5 . The continuous production system of  claim 1 , further comprising a raw material supplying mechanism configured to supply a raw material through the supply path to the continuous reactor, wherein
 the control by the controller includes controlling operation of the raw material supplying mechanism.   
     
     
         6 . The continuous production system of  claim 1 , further comprising:
 a first branch path and a second branch path which are connected to a terminating end of the guide path; and   a switching valve configured to selectively connect the guide path to the first branch path or the second branch path, wherein   the control by the controller includes controlling operation of the switching valve.   
     
     
         7 . The continuous production system of  claim 1 , further comprising:
 a cleaning flow path connected to the continuous reactor; and   a detergent supplying mechanism configured to supply a detergent through the cleaning flow path to the continuous reactor, wherein   the control by the controller includes controlling operation of the detergent supplying mechanism.