US2025264754A1PendingUtilityA1
Display panels, methods of manufacturing the same, and electronic devices
Assignee: JRD COMMUNICATION SHENZHEN LTDPriority: Feb 24, 2021Filed: Mar 17, 2025Published: Aug 21, 2025
Est. expiryFeb 24, 2041(~14.6 yrs left)· nominal 20-yr term from priority
Inventors:Guangyue Luo
G02F 1/136209G02F 1/1339G02F 1/13312G02F 1/1333G02F 1/133514G02F 1/133606
65
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Claims
Abstract
The present application discloses a display panel, a method of manufacturing the same, and an electronic device. The display panel includes an array substrate, a light blocking matrix, and a backlight module, wherein the array substrate, the light blocking matrix, and the backlight module are stacked in sequence, and the light blocking matrix includes light shielding columns in a grid-like arrangement.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method of manufacturing a display panel, comprising:
providing an array substrate, wherein the array substrate comprises at least a pixel matrix, the pixel matrix comprises a plurality of pixel units, a first spacing region is provided between adjacent ones of the plurality of pixel units and between adjacent sub-pixels in each of the plurality of pixel units, and pixel isolation walls are provided in the first spacing region, and comprise an opaque material; forming a photoresist layer on a side of the array substrate away from the pixel isolation wall; and performing an exposure process on a side of the array substrate close to the pixel isolation wall, and performing a development process to form the light blocking matrix.
2 . The method of claim 1 , further comprising: after forming the photoresist layer on the side of the array substrate away from the pixel isolation wall,
performing a soft baking process to remove a solvent from the photoresist layer.
3 . The method of claim 1 , wherein the forming of the photoresist layer comprises:
coating photoresist onto the side of the array substrate away from the pixel isolation wall to form the photoresist layer, and the photoresist is positive photoresist.
4 . The method of claim 3 , wherein the coating of the photoresist comprises:
coating the photoresist by spin coating or blade coating.
5 . The method of claim 1 , further comprising:
providing the array substrate, wherein the array substrate comprises at least the pixel matrix, the pixel matrix comprises the plurality of pixel units, the first spacing region is provided between adjacent ones of the plurality of pixel units and between adjacent sub-pixels in each of the plurality of pixel units, and the pixel isolation walls are provided in the first spacing region, and comprise the opaque material; providing a color filter substrate, wherein the color filter substrate comprises at least a light-filtering matrix comprising a plurality of light-filtering units, a second spacing region is provided between adjacent ones of the plurality of light-filtering units and between adjacent sub-light-filtering units in each of the plurality of light-filtering units, light-filtering isolation columns are provided in the second spacing region, and comprise an opaque material; stacking the color filter substrate, the pixel isolation walls, and the array substrate in sequence; forming the photoresist layer on the side of the array substrate away from the pixel isolation wall; and performing the exposure process on a side of the color filter substrate away from the pixel isolation wall, and performing the development process to form the light blocking matrix.
6 . The method of claim 5 , further comprising:
forming a frame sealant on the array substrate by coating, dripping liquid crystal on the color filter substrate to form a liquid crystal layer, forming an alignment film on each of the array substrate and the color filter substrate by coating, aligning the array substrate and the color film substrate and connecting the array substrate and the color film substrate through the frame sealant by a cell process, to form an LCD cell.Join the waitlist — get patent alerts
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