US2025270704A1PendingUtilityA1
Cold Spray Deposition with Pulsed Laser Sintering
Est. expiryMay 5, 2041(~14.8 yrs left)· nominal 20-yr term from priority
Inventors:Joel T. Harrison
C23C 30/00C23C 24/106C23C 24/10C23C 24/087C23C 24/082C23C 24/08C23C 4/134C23C 24/04
56
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Claims
Abstract
A material deposition method is provided for depositing a layer of a first material onto a substrate composed of a second material. The method includes accelerating an inert gas through a nozzle as a supersonic jet; inserting a powder of the first material into the nozzle; directing said jet with the powder towards the substrate to produce a film of the first material onto the substrate; and aiming a coherent electromagnetic beam from a laser towards the substrate to sinter the film into the layer. The first material can be Inconel 625 or a refractive high entropy alloy.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A material deposition method for providing a layer of a first material onto a substrate composed of a second material, said method comprising:
accelerating an inert gas through a nozzle as a supersonic jet; inserting a powder of the first material into said nozzle; directing said jet with said powder towards the substrate to produce a film of the first material onto the substrate; and aiming a coherent electromagnetic beam from a laser towards the substrate to sinter said film into the layer.
2 . The method according to claim 1 , wherein the first material has a higher melting point temperature than the second material.
3 . The method according to claim 1 , further including heating said inert gas prior to accelerating.
4 . The method according to claim 1 , wherein the first material is Inconel 625.
5 . The method according to claim 1 , wherein the first material is a refractive high entropy alloy.
6 . The method according to claim 5 , wherein the first material is tungsten-tantalum-niobium-molybdenium (WTaNbMo).
7 . The method according to claim 1 , further including pulsing said electromagnetic beam during aiming.Join the waitlist — get patent alerts
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