US2025270704A1PendingUtilityA1

Cold Spray Deposition with Pulsed Laser Sintering

Assignee: HARRISON JOEL TPriority: May 5, 2021Filed: May 9, 2025Published: Aug 28, 2025
Est. expiryMay 5, 2041(~14.8 yrs left)· nominal 20-yr term from priority
C23C 30/00C23C 24/106C23C 24/10C23C 24/087C23C 24/082C23C 24/08C23C 4/134C23C 24/04
56
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

A material deposition method is provided for depositing a layer of a first material onto a substrate composed of a second material. The method includes accelerating an inert gas through a nozzle as a supersonic jet; inserting a powder of the first material into the nozzle; directing said jet with the powder towards the substrate to produce a film of the first material onto the substrate; and aiming a coherent electromagnetic beam from a laser towards the substrate to sinter the film into the layer. The first material can be Inconel 625 or a refractive high entropy alloy.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A material deposition method for providing a layer of a first material onto a substrate composed of a second material, said method comprising:
 accelerating an inert gas through a nozzle as a supersonic jet;   inserting a powder of the first material into said nozzle;   directing said jet with said powder towards the substrate to produce a film of the first material onto the substrate; and   aiming a coherent electromagnetic beam from a laser towards the substrate to sinter said film into the layer.   
     
     
         2 . The method according to  claim 1 , wherein the first material has a higher melting point temperature than the second material. 
     
     
         3 . The method according to  claim 1 , further including heating said inert gas prior to accelerating. 
     
     
         4 . The method according to  claim 1 , wherein the first material is Inconel 625. 
     
     
         5 . The method according to  claim 1 , wherein the first material is a refractive high entropy alloy. 
     
     
         6 . The method according to  claim 5 , wherein the first material is tungsten-tantalum-niobium-molybdenium (WTaNbMo). 
     
     
         7 . The method according to  claim 1 , further including pulsing said electromagnetic beam during aiming.

Join the waitlist — get patent alerts

Track US2025270704A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.