Method of pretreatment for nail coating, method of decorating nail and plasma irradiation device

Abstract

The present invention provides a method of pretreatment for nail coating, the method including irradiating plasma to a nail, before the step of applying a nail coating liquid to the nail, wherein the gas used for generating the plasma is one or more gases selected from the group consisting of nitrogen gas, oxygen gas and carbon dioxide gas.

1 . A method of pretreatment for nail coating, the method comprising irradiating plasma to a nail or a nail coating liquid applied to the nail, before or during the step of applying the nail coating liquid to the nail,
 wherein the gas used for generating the plasma is one or more gases selected from the group consisting of nitrogen gas, oxygen gas and carbon dioxide gas.   
     
     
         2 . The method of pretreatment for nail coating according to  claim 1 , wherein the plasma is atmospheric pressure plasma. 
     
     
         3 . A method of decorating a nail, the method comprising:
 irradiating plasma to the nail;   applying a curable nail coating liquid to the nail; and   curing the curable nail coating liquid,   wherein the gas used for generating the plasma is one or more gases selected from the group consisting of nitrogen gas, oxygen gas, and carbon dioxide gas.   
     
     
         4 . The method of decorating a nail according to  claim 3 , wherein the method does not comprise a step of polishing the nail. 
     
     
         5 . A method of decorating a nail, the method comprising:
 irradiating plasma to a stone;   applying a curable nail coating liquid to the nail;   placing the stone irradiated with the plasma on the curable nail coating liquid applied on the nail; and   curing the curable nail coating liquid,   wherein the gas used for generating the plasma is one or more gases selected from the group consisting of nitrogen gas, oxygen gas and carbon dioxide gas.   
     
     
         6 . The method of decorating a nail according to  claim 3 , further comprising irradiating plasma to the curable nail coating liquid which is applied to the nail, and is before or after curing. 
     
     
         7 . A plasma irradiation device, comprising:
 a plasma generation section; and   a gas supply section,   wherein the plasma generation section has a porous structure with holes, and the plasma is emitted from each hole.   
     
     
         8 . The plasma irradiation device according to  claim 7 , wherein the holes have a diameter of from 0.3 to 3.0 mm. 
     
     
         9 . The plasma irradiation device according to  claim 7 , wherein the gas supply section supplies one or more gases selected from the group consisting of nitrogen gas, oxygen gas and carbon dioxide gas. 
     
     
         10 . The plasma irradiation device according to  claim 7 , wherein the plasma irradiation device is for irradiating plasma to at least one selected from the group consisting of a nail, a stone and a coating liquid. 
     
     
         11 . The method of decorating a nail according to  claim 5 , further comprising the step of irradiating plasma to the curable nail coating liquid which is applied to the nail, and is before or after curing. 
     
     
         12 . The plasma irradiation device according to  claim 8 , wherein the gas supply section supplies one or more gases selected from the group consisting of nitrogen gas, oxygen gas and carbon dioxide gas. 
     
     
         13 . The plasma irradiation device according to  claim 8 , wherein the plasma irradiation device is for irradiating plasma to at least one selected from the group consisting of a nail, a stone and a coating liquid.