Coated substrate

Abstract

A novel coated substrate which can be applied to various fields and can be mass-produced is provided. A coated substrate has a substrate coated with a film. The thickness of the film is 1 nm or greater and less than 800 nm. X-ray photoelectron spectroscopic measurement of the film shows that the percent element composition of C (carbon) is 0.1 atm % or greater and less than 20 atm %, and the total percent element composition of a metal element and O (oxygen) is 70 atm % or greater. The relative density of the film is 90% or greater. The film is amorphous.

What is claimed is: 
     
         1 . A coated substrate in which a substrate is coated with a film, wherein the thickness of the film is 1 nm or greater and less than 800 nm,
 x-ray photoelectron spectroscopic measurement of the film shows that the percent element composition of C (carbon) is 0.1 atm % or greater and less than 20 atm %, and the total percent element composition of a metal element and O (oxygen) is 70 atm % or greater,   the relative density of the film is 90% or greater, and   the film is amorphous.   
     
     
         2 . The coated substrate according to  claim 1 , wherein a portion of the substrate where the film is formed is electrically conductive. 
     
     
         3 . The coated substrate according to  claim 1 , wherein the film contains a compound having at least one type of structure selected from C—H bond, C═O bond, and C—O bond. 
     
     
         4 . The coated substrate according to  claim 1 , wherein the x-ray photoelectron spectroscopic measurement of the film shows that the percent element composition of a halogen element is 0.1 atm % or greater. 
     
     
         5 . The coated substrate according to  claim 1 , wherein the metal element is at least one or more metal elements selected from the group consisting of Al (aluminum), Ti (titanium), Mo (molybdenum), Cr (chromium), Mn (manganese), Fe (iron), Co (cobalt), Ni (nickel), Zr (zirconium), V (vanadium), W (tungsten), Ta (tantalum), Nb (niobium), and Sn (tin).