Polishing head and polishing treatment device

Abstract

Provided is a polishing head and a polishing treatment device that can cope with the wrinkle phenomenon, the star mark phenomenon and the like, further improve the SFOR or the like of the substrate surface and steadily perform a polishing treatment of a large number of substrates with high quality. A polishing head 100 includes a membrane support ring 3, a membrane 4 that covers a lower end-side opening part of the membrane support ring 3 and holds a substrate W with a backing film 5 pasted to a front surface side thereof interposed therebetween, and a retainer ring 6 shaped to accommodate the membrane support ring 3 and surround the outer circumference of the substrate W. On the back surface side of the membrane 4, a plurality of radial ribs 4 a that radially extend from the vicinity of the center of the membrane 4 and a circular rib 4 b that is shaped to have a size smaller than the size of the elastic body are formed, and the radial ribs 4 a are formed to radially extend outward from the circular rib 4 b. In a region defined by adjacent radial ribs 4 a, the membrane support ring 3 and the circular rib 4 b on the back surface side of the elastic body, a rib lock member 33 shaped to be in contact with the side surfaces of the adjacent radial ribs 4 a, the inner circumferential surface of the membrane support ring 3 and the outer circumferential surface of the circular rib 4 b is arranged.

1 . A polishing treatment device, comprising: a polishing table having a polishing pad; and a polishing head that holds a substrate to be polished and brings a polished surface of the substrate into sliding contact with the polishing pad,
 wherein the polishing head includes:   an annular body having an inner diameter enough to surround an outer circumference of the substrate to be polished;   an elastic body that covers a lower end-side opening part of the annular body and holds the substrate with a backing film pasted to a front surface side of the elastic body interposed therebetween;   a retainer ring shaped to accommodate the annular body and surround the outer circumference of the substrate; and   driving means that integrally horizontally rotates the annular body and the retainer ring,   a plurality of radial ribs that radially extend from a vicinity of a center of the elastic body and a circular rib that is shaped to have a size smaller than a size of the elastic body are formed on a back surface side of the elastic body, and the radial ribs are formed to radially extend outward from the circular rib, and   in a region defined by adjacent radial ribs, the annular body and the circular rib on the back surface side of the elastic body, a rib lock member shaped to be in contact with side surfaces of the adjacent radial ribs, an inner circumferential surface of the annular body and an outer circumferential surface of the circular rib is arranged.   
     
     
         2 . The polishing treatment device according to  claim 1 , further comprising: lock restraining means that couples the annular body and the rib lock member to each other. 
     
     
         3 . The polishing treatment device according to  claim 2 , wherein the annular body has a plurality of grooves formed in an inner circumferential surface thereof, and
 the lock restraining means includes a disk-like body formed to have a size that is accommodated in an inner region of the circular rib and a bar-like body formed to extend outward from the disk-like body and is engaged with a groove at an end thereof.   
     
     
         4 . The polishing treatment device according to  claim 1 , wherein on the back surface side of the elastic body, a plurality of annular ribs formed to have sizes smaller than the size of the elastic body, and
 an annular rib locking member is arranged which covers a part or a whole of each of an inner circumferential surface and an outer circumferential surface of each of the annular ribs.   
     
     
         5 . The polishing treatment device according to  claim 1 , wherein on the back surface side of the elastic body, a plurality of annular ribs formed to have sizes smaller than the size of the elastic body, and
 an annular rib locking member is arranged in each of back surface-side regions of the elastic body between adjacent annular ribs, the annular rib locking member having a same size as the back surface-side region of the elastic body and having a hole formed in a surface thereof.   
     
     
         6 . The polishing treatment device according to  claim 1 , wherein the retainer ring includes a plurality of retainer members having a sectoral shape, and has adjustment means that moves each retainer member outward with respect to a center of the retainer ring to change a diameter of the retainer ring. 
     
     
         7 . The polishing treatment device according to  claim 6 , further comprising a rotary frame that integrally horizontally rotates the annular body and the retainer ring,
 wherein each of the retainer members has an arc of a circle that is formed to have a curvature different from a curvature of the retainer member with respect to the center of the retainer ring,   the rotary frame has sandwiching means that sandwiches an arc of a circle, and   the adjustment means controls rotating means that rotates the rotary frame within a predetermined range to move the retainer members outward, thereby changing the diameter of the retainer ring.   
     
     
         8 . The polishing treatment device according to  claim 6 , wherein each of the retainer members is connected to the annular body by a drive pin. 
     
     
         9 . A polishing head provided in a polishing treatment device that has a polishing pad that horizontally rotates, comprising:
 an annular body having an inner diameter enough to surround an outer circumference of a substrate to be polished;   an elastic body that covers a lower end-side opening part of the annular body and holds the substrate with a backing film pasted to a front surface side of the elastic body interposed therebetween;   a retainer ring shaped to accommodate the annular body and surround the outer circumference of the substrate; and   driving means that integrally horizontally rotates the annular body and the retainer ring,   a plurality of radial ribs that radially extend from a vicinity of a center of the elastic body and a circular rib that is shaped to have a size smaller than a size of the elastic body are formed on a back surface side of the elastic body, and the radial ribs are formed to radially extend outward from the circular rib, and   in a region defined by adjacent radial ribs, the annular body and the circular rib on the back surface side of the elastic body, a rib lock member shaped to be in contact with side surfaces of the adjacent radial ribs, an inner circumferential surface of the annular body and an outer circumferential surface of the circular rib is arranged.