P
US4115128AExpiredUtilityPatentIndex 99

Positive image forming radiation sensitive compositions containing diazide compound and organic cyclic anhydride

Assignee: FUJI PHOTO FILM CO LTDPriority: Dec 26, 1975Filed: Dec 17, 1976Granted: Sep 19, 1978
Est. expiryDec 26, 1995(expired)· nominal 20-yr term from priority
Inventors:KITA NOBUYUKI
G03F 7/0226
99
PatentIndex Score
174
Cited by
1
References
6
Claims

Abstract

A radiation-sensitive composition capable of producing a positive image upon exposure to actinic radiation and subsequent treatment with a basic solution which comprises (a) an o-naphthoquinone diazide compound, (b) an alkali soluble film-forming phenolic resin and (c) an organic acid cyclic anhydride.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A radiation-sensitive composition capable of producing a positive image upon exposure to actinic radiation and subsequent treatment with a basic solution which consists essentially of, by weight based on weight of the total composition, (a) 10 to 50 weight percent of an o-naphthoquinone diazide compound, (b) 45 to 79 weight percent of an alkali soluble film-forming phenolic resin and (c) 1 to 15 weight percent of an organic acid cyclic anhydride represented by the following formulae (II) or (III) ##STR3## wherein R 1  and R 2  each represents a hydrogen atom, a halogen atom, an unsubstituted or substituted alkyl group, or an unsubstituted or substituted aryl group, and R 1  and R 2  may combine together to form a cyclic ring. 
     
     
       2. The composition of claim 1, wherein said o-naphthoquinone diazide compound is an ester of a halide of naphthoquinone(1,2)-diazide-(2)-sulfonic acid and a phenolic compound. 
     
     
       3. The composition of claim 1, wherein said o-naphthoquinone diazide compound is an ester of a halide of naphthoquinone-(1,2)-diazide-(2)-sulfonic acid and a pyrogallol-acetone condensation resin, a phenolformaldehyde novolac resin or a poly(hydroxy styrene). 
     
     
       4. The composition of claim 1, wherein said phenolic resin is a phenol/formaldehyde novolac resin, a cresol/formaldehyde novaolac resin, a p-tert-butyl phenol/formaldehyde novolac resin, a phenolmodified xylene/formaldehyde resin, a poly(hydroxystyrene) or a poly(bromohydroxystyrene). 
     
     
       5. The composition of claim 1, wherein said organic acid cyclic anhydride is phthalic acid anhydride, tetrachlorophthalic acid anhydride, tetrahydrophthalic acid anhydride, hexahydrophthalic acid anhydride, 3,6-endoxy-Δ 4  -tetrahydrophthalic acid anhydride, maleic acid anhydride, α-chloromaleic acid anhydride, α-phenylmaleic acid anhydride, succinic acid anhydride or pyromellitic acid anhydride. 
     
     
       6. The composition of claim 1 wherein said cyclic ring is a cycloalkyl group, a halo (cycloalkyl) group, a cycloalkylene group, an aryl group, or a heterocyclic group.

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