US4246147AExpiredUtilityPatentIndex 90
Screenable and strippable solder mask and use thereof
Est. expiryJun 4, 1999(expired)· nominal 20-yr term from priority
B23K 35/224H05K 3/0076H05K 3/3452H05K 2201/0166H05K 2201/0209H05K 2203/0264H05K 2203/0769H05K 2203/0783Y10T428/264Y10T428/263
90
PatentIndex Score
33
Cited by
13
References
33
Claims
Abstract
A screenable and strippable solder mask composition which contains a polyepoxide or polyimide/amide; a detackifier and a high-temperature resistant filler; and use thereof for protecting predetermined areas on a substrate from the solder deposition.
Claims
exact text as granted — not AI-modifiedHaving thus described our invention, what we claim is new, and desire to secure by Letters Patent is:
1. A screenable, strippable solder mask composition containing: A. a film-forming polymer portion in the form of a liquid composition wherein the film-forming polymer is a polyimide/amide or a liquid polyepoxide; B. a detackifier compatible with the polymer being selected form the group of (1) liquid silicone oil (2) terpene (3) terpineol (4) drying oil, and (5) mixtures thereof; C. a solid high temperature resistant filler in an amount sufficient to render the composition removable from the substrate after solder application; wherein the ratio of A:B is about 2:1 to about 1:3, and provided that when A is a polyepoxide liquid, B includes said silicone oil; and wherein said composition is at least substantially free of hardener for said film-forming polymer.
2. The solder mask composition of claim 1 wherein the film-forming polymer is a liquid polyepoxide.
3. The solder mask composition of claim 1 wherein said film-forming polymer is a polyepoxide of epichlorohydrin and bisphenol A.
4. The solder mask composition of claim 1 wherein said polyepoxide has a viscosity of about 400 to about 5000 centipoises at 25° C., and a molecular weight of about 170 to about 250.
5. The solder mask composition of claim 1 wherein said film-forming polymer is a polyimide/amide polymer.
6. The solder mask composition of claim 1 wherein said film-forming polymer portion is a solution of a polyimide/amide in N-methyl-2-pyrrolidone.
7. The solder mask composition of claim 1 wherein said film-forming polymer is a polyimide/amide from pyromellitic dianhydride and 4,4'-diaminodiphenylether.
8. The solder mask composition of claim 1 wherein said detackifier is a liquid silicone oil.
9. The solder mask composition of claim 1 wherein said detackifier is a polydimethylsiloxane.
10. The solder mask composition of claim 1 wherein said detackifier is a terpineol.
11. The solder mask composition of claim 1 wherein said detackifier has a viscosity of about 25 to about 500 centipoises at 25° C.
12. The solder mask composition of claim 1 wherein said filler has a particle size of about 0.1 to about 20 microns.
13. The solder mask composition of claim 1 wherein said filler has a particle size of about 0.1 to about 5 microns.
14. The solder mask composition of claim 1 wherein said filler is selected from the group of ground glass, zinc oxide, silicon dioxide, alumina, high temperature resistant sands, and mixtures thereof.
15. The solder mask composition of claim 1 which has a viscosity of about 700 to about 15,000 centipoises at 25° C.
16. The solder mask composition of claim 1 having a viscosity of about 1000 to about 13,000 centipoises at 25° C.
17. The solder mask composition of claim 1 having a viscosity of about 7000 to about 12,500 centipoises at 25° C.
18. The solder mask composition of claim 1 wherein the ratio of the film-forming polymer of the polymer portion of the composition relative to the detackifier is about 1:1 to about 2:3.
19. The solder mask composition of claim 1 wherein the amount of filler relative to the film-forming polymer component of the polymer portion of the composition is about 1:6 to 6:1.
20. The solder mask composition of claim 1 wherein said detackifier is a natural drying oil.
21. The solder mask composition of claim 1 wherein the amount of filler relative to the film-forming polymer component of the polymer portion of the composition is about 2:1 to about 6:1.
22. The composition of claim 1 which is entirely free of hardener for said film-forming polymer.
23. A substrate coated in predetermined areas less than the entire area with the solder mask of claim 1.
24. The substrate of claim 23 wherein the coating thickness is about 1 to about 25 mils.
25. The method of claim 24 wherein the application of solder is conducted at a temperature of about 300° to about 400° C.
26. The substrate of claim 23 wherein the coating thickness is about 5 to about 10 mils.
27. The substrate of claim 23 wherein the coating thickness is about 2 to about 3 mils.
28. A method for protecting predetermined areas on a substrate from solder deposition which comprises: A. applying to predetermined areas less than the entire area of a substrate by screen printing a screenable and strippable mask composition containing: (1) a film-forming polymer portion in the form of a liquid composition wherein the film-forming polymer is a polyimide/amide or a liquid polyepoxide; (2) a detackifier compatible with the polymer being selected from the group of (a) liquid silicone oil (b) terpene (c) terpineol (d) drying oil, and (e) mixtures thereof; (3) a solid high temperature resistant filler in an amount sufficient to render the composition removable from the substrate after solder application wherein the ratio of A:B is about 2:1 to about 1:3, and provided that when A is a polyepoxide liquid, B includes said silicone oil; and wherein said composition is at least substantially free of hardener from said film-forming polymer; B. drying the coated substrate to thereby harden the composition; C. applying solder whereby said solder does not adhere to those areas protected by the solder mask; D. removing the solder mask.
29. The method of claim 28 wherein said solder mask is removed by contact with a solvent at elevated temperature.
30. The method of claim 28 wherein said elevated temperature is about 100° to about 180° C.
31. The method of claim 28 wherein said drying is conducted at a temperature of about 50° C. to about 150° C.
32. The method of claim 28 wherein said drying is conducted at a temperature of about 150° C.
33. The method of claim 28 wherein said composition is entirely free of hardener for said film-forming polymer.Cited by (0)
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