Laser CVD device

Abstract

In a laser CVD device, immediately before being emitted from a nozzle, raw gas in a reaction chamber reacts opto-chemically with a focused laser beam so that it is decomposed to form a radical flow. The radical flow flows against a substrate set in the reaction chamber so that active materials produced by the optochemical decomposition accumulate on the substrate to form a thin film thereon.

What is claimed is: 
     
       1. A laser CVD device comprising: a reaction chamber;   a substrate supporting member provided in said reaction chamber;   a raw gas introducing pipe extending into said reaction chamber and having a nozzle connected thereto with an orifice at one end for emitting a flow of raw gas towards said substrate supporting member;   a laser beam source provided outside said reaction chamber; and   an optical system for focusing a laser beam from said laser beam source on said one end of the nozzle for irradiating substantially all of the raw gas emitted into the reaction chamber through said orifice from said nozzle.   
     
     
       2. A device according to claim 1, wherein said reaction chamber includes a window for admitting said laser beam into said chamber such that the direction of said beam is substantially perpendicular to said flow of raw gas. 
     
     
       3. A device according to claim 2, wherein said optical system includes a lens. 
     
     
       4. A device according to claim 2, wherein said raw gas introducing pipe has a plurality of nozzles connected thereto for emitting streams of raw gas toward said substrate supporting member. 
     
     
       5. A device according to claim 4, wherein said plurality of nozzles is arranged in a matrix of rows and columns. 
     
     
       6. A device according to claim 5, wherein said laser beam source includes means for producing a plurality of beams, and wherein said optical system focuses each of said beams on said one end of each of said plurality of nozzles in the same row in said matrix. 
     
     
       7. A device according to claim 1, wherein said laser beam source produces laser beam pulses to be focused on said flow of raw gas emitted from said nozzle, and wherein said nozzle includes a valve means for opening and closing said orifice of said nozzle to emit a pulse of said gas therefrom in synchronization with said pulses of said laser beam.