Positive radiation-sensitive mixture, using a monomeric silylenol ether and a recording material produced therefrom

Abstract

The invention relates to a positive radiation-sensitive mixture containing a compound which forms an acid under the action of actinic radiation, an acid-cleavable compound, and a binder, wherein the acid-cleavable compound comprises a monomeric silylenol ether. The radiation-sensitive mixture described has a better shelf life than the prior art products and a high structural resolution.

What is claimed is: 
     
       1. A positive radiation-sensitive mixture, comprising: a compound which forms an acid under the action of actinic radiation,   a monomeric acid-cleavable compound, and   a binder that is insoluble in water and soluble in aqueous alkaline-solution,   wherein the acid-cleavable compound comprises a silylenol ether group of the formula I ##STR8## in which R 1  and R 2  are identical of different and denote alkyl, cycloalkyl or aryl,   R 3  denotes alkyl, cycolalkyl, aryl or --O--R 7 ,   R 4 , R 5  and R 6  are identical or different and denote hydrogen, alkyl, cycloalkyl, alkenyl, cycloalkenyl or aryl, and   R 7  denotes hydrogen, alkyl, cycloalkyl, alkenyl, loalkenyl, aryl or silyl.   
     
     
       2. A radiation-sensitive mixture as claimed in claim 1, further comprising a second acid-cleavable compound. 
     
     
       3. A radiation-sensitive mixture as claimed in claim 2, where in the second acid-cleavable compound comprises a silyl ether group. 
     
     
       4. A radiation-sensitive mixture as claimed in claim 1, wherein the compound which forms an acid is monomeric. 
     
     
       5. A positive recording material, comprising: a substrate; and   a radiation-sensitive layer on said substrate wherein the layer is produced from a radiation-sensitive mixture as claimed in claim 1.   
     
     
       6. A process for the production of an imaged positive recording material, comprising the steps of: applying a radiation-sensitive mixture as claimed in claim 1 to a substrate;   drying the layer;   irradiating the dried layer imagewise with actinic radiation, and   developing the irradiated layer with an aqueous-alkaline developer to produce an image.   
     
     
       7. A process for the production of an imaged positive recording material as claimed in claim 6, wherein the substrate is coated with an adhesion promoter before applying the radiation-sensitive mixture. 
     
     
       8. A radiation-sensitive mixture as claimed in claim 1, wherein R 1 , R 2  and R 3  are selected from the group consisting of methyl, phenyl and --O--R 7 . 
     
     
       9. A radiation-sensitive mixture as claimed in claim 1, wherein R 7  is --CR 4  =CR 5  -R 6 . 
     
     
       10. A radiation-sensitive mixture as claimed in claim 9, wherein R 4  and R 5  are cyclized to form a cycloaliphatic ring, and R 6  is hydrogen. 
     
     
       11. A radiation-sensitive mixture as claimed in claim 1, wherein R 3  is (C 1  -C 6 )alkyl, (C 5  -C 6 )cycloalkyl, (C 6  -C 10 )aryl, R 1  and R 2  are identical and denote (C 1  -C 3 )alkyl, C 5  - or C 6  -cycloalkyl or (C 6  -C 10 )aryl. 
     
     
       12. A radiation-sensitive mixture as claimed in claim 11, wherein no more than two of R 1 , R 2  and R 3  denote a cyclic radical. 
     
     
       13. A radiation-sensitive mixture as claimed in claim 12, wherein R 3  is (C 1  -C 6 )alkyl. 
     
     
       14. A radiation-sensitive mixture as claimed in claim 13, wherein R 5  and R 6  are hydrogen and R 4  is alkenyl or cycloalkyl. 
     
     
       15. A radiation-sensitive mixture as claimed in claim 15, wherein R 4  and R 5  are cyclized to form a cycloaliphatic ring and R 6  is hydrogen, alkenyl or aryl. 
     
     
       16. A radiation-sensitive mixture as claimed as claimed in claim 15, wherein R 6  is hydrogen 
     
     
       17. A radiation-sensitive mixture as claimed in claim 1, wherein the acid-cleavable compound comprises a silylenol ether group of the formula I in which: R 1  and R 2  are identical or different and denote (C 1  -C 3 )alkyl, C 5  - or C 6  -cycloalkyl or (C 6  -C 10 )aryl;   R 3  denotes (C 1  -C 6 )alkyl, C 5  - or C 6  -cycloalkyl, (C 6  -C 10 )aryl, or --O--R 7  ;   R 4 , R 5  and R 6  are identical or different and denote hydrogen, (C 1  -C 3 )alkyl, alkenyl, cycloalkenyl or aryl, the C--C double bonds in these radicals being conjugated with the double bond in --CR 4  ═CR 5  --, and (C 1  -C 6 )alkenyl and C 5  - or C 6  cycloalkenyl provide only one double bond for conjugation; or aryl which may be substituted or etherfied with alkyl- or arylhalosilanes; and   R 7  denotes (C 1  -C 6 )alkyl, (C 5  -C 10 )cycloalkyl, (C 1  -C 6 )alkenyl, (C 5  -C 10 )cycloalkenyl and (C 6  -C 10 )aryl.   
     
     
       18. A radiation-sensitive mixture as claimed in claim 17, wherein the acid-cleavable compound comprises a silylenol ether group of the formula I in which R 1 , R 2  and R 3  are methyl or phenyl.