Equipment for manufacturing semiconductor devices

Abstract

An equipment for manufacturing semiconductor devices has: a reaction chamber in which a substrate to be processed is placed; means for evacuating the reaction chamber; means for introducing a reaction gas into the reaction chamber; means for applying polarized light to the surface of the substrate for the purpose of depositing a thin film on the surface of the substrate using a photochemical reaction between the light and the reaction gas; and means for adjusting the direction of polarization of the light so as to be substantially perpendicular to the longitudinal axis of a stepped circuit pattern present on the surface of the substrate for the purpose of flattening the circuit pattern.

What is claimed is: 
     
       1. An equipment for manufacturing semiconductor devices comprising a reaction chamber provided with a substrate stage upon which a substrate having a stepped circuit pattern to be processed is placed; means for evacuating said reaction chamber; means for introducing a reaction gas into said reaction chamber; means for applying linearly polarized light to the surface of said substrate to deposit a thin film on the surface of said substrate using a photochemical reaction between said light and said reaction gas; said light application means comprising a light source for supplying light and a polarizer for making uniform the direction of polarization of light emitted from said light source; and means for adjusting a direction of polarization of said light so that said direction of polarization is in a plane including both a normal direction with respect to a side surface of said stepped circuit pattern and an incident direction of said light to said substrate. 
     
     
       2. An equipment for manufacturing semiconductor devices according to claim 1, wherein said adjustment means comprises a polarization rotator capable of rotating within a horizontal plane to adjust the direction of polarization of said light to said substrate. 
     
     
       3. An equipment for manufacturing semiconductor devices according to claim 2, wherein said adjustment means further comprises said substrate stage capable of rotating within a horizontal plane to adjust the direction of polarization of said light to said substrate. 
     
     
       4. An equipment for manufacturing semiconductor devices according to claim 1, wherein said adjustment means comprises a polarization rotator rotatable within a horizontal plane and said substrate stage rotatable within a horizontal plane to adjust the direction of polarization of said light to said substrate.