US5073655AExpiredUtility
Method for preparing diarylalkanes
Est. expiryOct 6, 2008(expired)· nominal 20-yr term from priority
B01J 29/04C07C 2/12C07C 2529/70
50
PatentIndex Score
12
Cited by
17
References
22
Claims
Abstract
Diarylalkanes are prepared by alkylating an aromatic hydrocarbon with an aromatic alkylation agent in the presence of a synthetic porous crystalline material catalyst composition. The aromatic hydrocarbon can be, for example, benzene, toluene, naphthalene, etc. The aromatic alkylating agent can be an aromatic compound with a hydroxy group, such as phenol, or benzyl alcohol, or an aromatic halide, aldehyde, ether, or an aromatic olefin such as styrene.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A process for producing a diarylalkane from a feedstock containing at least one alkylatable aromatic hydrocarbon compound and an aromatic alkylating agent having at least one alkylating group, said process comprising contacting said feedstock with a catalyst composition under alkylation reaction conditions to produce an alkylate product containing at least one diarylalkane compound, and said catalyst composition comprising a synthetic porous crystalline material characterized by an X-ray diffraction pattern including values substantially as follows: ______________________________________
Interplanar d-Spacing (A)
Relative Intensity, I/I° × 100
______________________________________
12.36 ± 0.4 M-VS
11.03 ± 0.2 M-S
8.83 ± 0.14 M-VS
6.18 ± 0.12 M-VS
6.00 ± 0.10 M-M
4.06 ± 0.07 W-S
3.91 ± 0.07 M-VS
3.42 ± 0.06 VS
______________________________________
2. The process of claim 1 wherein said synthetic porous crystalline material is characterized by an X-ray diffraction pattern including values substantially as follows: ______________________________________
Interplanar d-Spacing (A)
Relative Intensity, I/I.sup.o × 100
______________________________________
30.0 ± 2.2 W-M
22.1 ± 1.3 W
12.36 ± 0.4 M-VS
11.03 ± 0.2 M-S
8.83 ± 0.14 M-VS
6.18 ± 0.12 M-VS
6.00 ± 0.10 W-M
4.06 ± 0.07 W-S
3.91 ± 0.07 M-VS
3.42 ± 0.06 VS
______________________________________
3. The process of claim 1 wherein the synthetic porous crystalline material is characterized by an X-ray diffraction pattern including values substantially as follows: ______________________________________
Interplanar d-Spacing (A)
Relative Intensity, I/I.sup.o × 100
______________________________________
12.36 ± 0.4 M-VS
11.03 ± 0.2 M-S
8.83 ± 0.14 M-VS
6.86 ± 0.14 W-M
6.18 ± 0.12 M-VS
6.00 ± 0.10 W-M
5.54 ± 0.10 W-M
4.92 ± 0.09 W
4.64 ± 0.08 W
4.41 ± 0.08 W-M
4.25 ± 0.08 W
4.10 ± 0.07 W-S
4.06 ± 0.07 W-S
3.91 ± 0.07 M-VS
3.75 ± 0.06 W-M
3.56 ± 0.06 W-M
3.42 ± 0.06 VS
3.30 ± 0.05 W-M
3.20 ± 0.05 W-M
3.14 ± 0.05 W-M
3.07 ± 0.05 W
2.99 ± 0.05 W
2.82 ± 0.05 W
2.78 ± 0.05 W
2.68 ± 0.05 W
2.59 ± 0.05 W
______________________________________
4. The process of claim 1 wherein the synthetic porous crystalline material is characterized by an X-ray diffraction pattern including values substantially as follows: ______________________________________
Interplanar d-Spacing (A)
Relative Intensity, I/I.sup.o × 100
______________________________________
30.0 ± 2.2 W-M
22.1 ± 1.3 W
12.36 ± 0.4 M-VS
11.03 ± 0.2 M-S
8.83 ± 0.14 M-VS
6.86 ± 0.14 W-M
6.18 ± 0.12 M-VS
6.00 ± 0.10 W-M
5.54 ± 0.10 W-M
4.92 ± 0.09 W
4.64 ± 0.08 W
4.41 ± 0.08 W-M
4.25 ± 0.08 W
4.10 ± 0.07 W-S
4.06 ± 0.07 W-S
3.91 ± 0.07 M-VS
3.75 ± 0.06 W-M
3.56 ± 0.06 W-M
3.42 ± 0.06 VS
3.30 ± 0.05 W-M
3.20 ± 0.05 W-M
3.14 ± 0.05 W-M
3.07 ± 0.05 W
2.99 ± 0.05 W
2.82 ± 0.05 W
2.78 ± 0.05 W
2.68 ± 0.05 W
2.59 ± 0.05 W
______________________________________
5. The process of claim 1 wherein the synthetic porous crystalline material has a composition comprising the molar relationship: X.sub.2 O.sub.3 :(n)YO.sub.2 wherein X is a trivalent element selected from the group consisting of aluminum, boron, iron and gallium, Y is a tetravalent element selected from the group consisting of silicon and germanium, and n is at least about 10.
6. The process of claim 2 wherein the synthetic porous crystalline material has a composition comprising the molar relationship: X.sub.2 O.sub.3 :(n)YO.sub.2 wherein X is a trivalent element selected from the group consisting of aluminum, boron, iron and gallium, Y is a tetravalent element selected the group consisting of silicon and germanium, and n is at least about 10.
7. The process of claim 3 wherein the synthetic porous crystalline material has a composition comprising the molar relationship: X.sub.2 O.sub.3 :(n)YO.sub.2 wherein X is a trivalent element selected from the group consisting of aluminum, boron, iron and gallium, Y is a tetravalent element selected from the group consisting of silicon and germanium, and n is at least about 10.
8. The process of claim 4 wherein the synthetic porous crystalline material has a composition comprising the molar relationship: X.sub.2 O.sub.3 :(n)YO.sub.2 wherein X is a trivalent element selected from the group consisting of aluminum, boron, iron and gallium, Y is a tetravalent element selected from the group consisting of silicon and germanium, and n is at least about 10.
9. The process of claim 1, wherein the synthetic porous crystalline material possesses equilibrium absorption capacities greater than about 4.5 weight percent for cyclohexane vapor and greater than about 10 weight percent for n-hexane vapor.
10. The process of claim 1 wherein said synthetic porous crystalline material has been treated to replace original cations, at least in part, with a cation or mixture of cations selected from the group consisting of hydrogen, rare earth metals, and metals of Groups IIA, IIIA, IVA, IB, IIB, IIIB, IVB and VIII of the Periodic Table.
11. The process of claim 10 wherein said synthetic porous crystalline material has been thermally treated in the presence or absence of steam at a temperature of up to about 925° C.
12. The process of claim 1 wherein said synthetic porous crystalline material has been thermally treated in the presence or absence of steam at a temperature of up to about 925° C.
13. The process of claim 1 wherein said alkylatable aromatic compound is selected from the group consisting of benzene, naphthalene, anthracene, naphthacene, perylene, coronene and phenanthrene.
14. The process of claim 1 wherein the alkylatable aromatic compound is selected from the group consisting of toluene, xylene, isopropylbenzene, normal propylbenzene, alpha-methylnaphthalene, ethylbenzene, cumene, mesitylene, durene, p-cymene, butylbenzene, pseudocumene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, isoamylbenzene, isohexylbenzene, pentaethylbenzene, pentamethylbenzene; 1,2,3,4-tetraethylbenzene, 1,2,3,5-tetramethylbenzene; 1,2,4-triethylbenzene; 1,2,3-trimethylbenzene, m-butyltoluene; p-butyltoluene; 3,5-diethyltoluene; o-ethyltoluene; p-ethyltoluene; m-propyltoluene; 4-ethyl-m-xylene; dimethylnaphthalenes; ethylnaphthalene; 2,3-dimethylanthracene; 9-ethylanthracene; 2-methylanthracene; o-methylanthracene; 9-10-dimethylphenanthrene; and 3-methyl-phenanthrene.
15. The process of claim 1 wherein the alkylating agent is an olefin.
16. The process of claim 1 wherein the alkylating agent is an alcohol.
17. The process of claim 1 wherein the alkylating agent is an alkyl halide.
18. The process of claim 1 wherein said alkylating conditions include a temperature of between about 0° C. and 550° C., a pressure of between about 0 and 2000 psig, and a space velocity of between about 0.1 and 25 hr -1 WHSV.
19. The process of claim 1 wherein said alkylation conditions include a temperature of between about 50° C. and 500° C., a pressure of between about 25 and 1000 psiq, and a space velocity of between about 0.5 and 15 hr -1 WHSV.
20. The process of claim 1 wherein said alkylation conditions include a temperature of between about 100° C. and 450° C., a pressure of between about 50 and 700 psig, and a space velocity of between about 1 and 10 hr -1 WHSV.
21. The process of claim 1 wherein said catalyst composition includes a matrix material.
22. The process of claim 21 wherein said matrix material is selected from the group consisting of silica, alumina, zirconia, titania, magnesia, beryllia, thoria, and combinations thereof.Cited by (0)
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