US5112671AExpiredUtility
Tile product having multiple levels of height, multiple levels of gloss and mortar-line surround
Est. expiryApr 13, 2009(expired)· nominal 20-yr term from priority
B32B 27/08B32B 2310/0868B32B 2419/04B29L 2031/104B32B 37/06Y10T428/2457Y10T428/16Y10T428/24967Y10T428/24901E04F 15/10Y10T428/24488Y10T428/24504Y10T428/162Y10T428/24612Y10T428/24942B32B 27/20Y10T428/31935Y10T428/24876Y10T428/2495B29C 35/12Y10T428/24868B32B 27/22B32B 37/1018B29C 59/026B29K 2027/06Y10T428/24802B29C 2791/001Y10T428/24777B32B 27/30Y10T428/24479B32B 2327/06B32B 27/304B32B 38/06
92
PatentIndex Score
191
Cited by
10
References
16
Claims
Abstract
A tile product having a substantially non-porous vinyl composition base and a multilevel embossing and gloss which has a mechanically embossed mortar-line surround and which is free of gloss defects formed by pockets of air trapped between the wear layer and embossing mold during embossing is produced by applying a vacuum to the press during embossing. Preferably, the tile is laminated in a hot press heated by RF energy and cooled in a cold press to reduce the temperature of the wear layer to below its glass transition temperature.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A tile comprising a substantially non-porous base and a wear layer, wherein said wear layer is a polymeric film laminated to said base, said film being embossed, said film being of substantially homogeneous composition, said film having an exposed surface opposite said base, said exposed surface having multiple levels of height and multiple levels of gloss, the tile having a mortar-line surround around the periphery of the tile, said mortar-line surround being a mechanically embossed depression around the periphery of the tile, the depression being at least 6 mils deep, wherein the mortar-line surround depression is in registration with a pattern printed on the tile, the gloss level difference being at least 20 as measured by a Gardner gloss meter at 60°.
2. The tile of claim 1 wherein the exposed surface includes an area with a continual gradation in gloss level.
3. The tile of claim 1 wherein the mortar-line surround depression is in registration with a mortar line printed on the tile.
4. The tile of claim 1 wherein the tile is printed and the embossing is in registration with the printed image.
5. The tile of claim 1 wherein the film is at least 10 mils thick.
6. The tile of claim 5 wherein the film is at least 15 mils thick.
7. The tile of claim 1 wherein the gloss level difference is at least 40 as measured by a Gardner gloss meter at 60°.
8. The tile of claim 1 wherein the depression is at least 8 mils deep.
9. The tile of claim 1 wherein the polymeric film is a thermoplastic film.
10. The tile of claim 1 wherein the polymeric film is a non-foamed polymeric layer.
11. The tile of claim 7 wherein the polymeric film is a non-foamed polymeric layer.
12. A tile consisting essentially of a substantially non-porous base and a polymeric wear layer laminated to said base, said layer being embossed, said layer being of substantially homogeneous composition, said layer having an exposed surface opposite said base, said exposed surface having multiple levels of height and multiple levels of gloss, the tile having a mortar-line surround around the periphery of the tile, said mortar-line surround being a mechanically embossed depression around the periphery of the tile, the depression being at least 6 mils deep, wherein the mortar-line surround depression is in registration with a pattern printed on the tile, the gloss level difference being at least 20 as measured by a Gardner gloss meter at 60°.
13. The tile of claim 12 wherein the polymeric layer is a non-foamed polymeric layer.
14. The tile of claim 12 wherein the gloss level difference is at least 40 as measured by a Gardner gloss meter at 60°.
15. The tile of claim 14 wherein the polymeric layer is a non-foamed polymeric layer.
16. The tile of claim 12 further consisting of a decorative ink pattern printed on the polymeric layer adjacent the base.Cited by (0)
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References (0)
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