US5319220AExpiredUtility
Silicon carbide semiconductor device
Est. expiryJan 20, 2008(expired)· nominal 20-yr term from priority
H10D 62/8325H10D 10/821H10F 77/1226H10H 20/826Y10S438/931
76
PatentIndex Score
40
Cited by
17
References
2
Claims
Abstract
A silicon carbide semiconductor device is provided which includes at least one heterojunction composed of two different polytypes of silicon carbide. The two polytypes of silicon carbide in the heterojunction include a β-type silicon carbide layer having an α-type silicon carbide layer disposed thereon.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A silicon carbide semiconductor device comprising at least one α/βheterojunction, wherein the device comprises a light-emitting diode including: an n-type conductivity β-type silicon carbide semiconductor substrate, a first p-type conductivity β-type silicon carbide semiconductor layer grown on said n-type conductivity β-type silicon carbide semiconductor substrate, a second p-type conductivity α-type silicon carbide semiconductor layer grown on said p-type conductivity B-type silicon carbide semiconductor layer formed on said n-type conductivity β-type silicon carbide semiconductor substrate, an n-sided ohmic electrode disposed on a back face of said n-type conductivity β-type silicon carbide semiconductor substrate opposite to the face of said n-type conductivity β-type silicon carbide semiconductor substrate having said first p-type conductivity β-type silicon carbide semiconductor layer grown thereon, and a p-sided ohmic electrode disposed on the upper face of said second p-type conductivity α-type silicon carbide semiconductor layer.
2. A silicon carbide semiconductor device comprising at least one α/βheterojunction, wherein the device comprises a bipolar transistor including: an n-type conductivity β-type silicon carbide collector layer, a p-type conductivity β-type silicon carbide base layer grown on said n-type conductivity β-type silicon carbide collector layer, an n-type conductivity α-type silicon carbide emitter layer grown on said p-type conductivity β-type silicon carbide base layer, a collector electrode disposed on a back face of said n-type conductivity β-type silicon carbide collector layer opposite to the face of said n-type conductivity β-type silicon carbide collector layer having said p-type conductivity β-type silicon carbide base layer grown thereon, and an emitter electrode disposed on the upper face of said n-type conductivity α-type silicon carbide emitter layer.Cited by (0)
No later patents cite this yet.
References (0)
No backward citations on record.