P
US5367141AExpiredUtilityPatentIndex 96

Photochemical cutting of fabrics

Assignee: US ARMYPriority: Mar 26, 1993Filed: Mar 26, 1993Granted: Nov 22, 1994
Est. expiryMar 26, 2013(expired)· nominal 20-yr term from priority
Inventors:PILTCH MARTIN S
B23K 26/066B23K 2103/50B26F 3/16B23K 2103/38
96
PatentIndex Score
54
Cited by
4
References
9
Claims

Abstract

Apparatus for the cutting of garment patterns from one or more layers of fabric. A laser capable of producing laser light at an ultraviolet wavelength is utilized to shine light through a pattern, such as a holographic phase filter, and through a lens onto the one or more layers of fabric. The ultraviolet laser light causes rapid photochemical decomposition of the one or more layers of fabric, but only along the pattern. The balance of the fabric of the one or more layers of fabric is undamaged.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. Apparatus for cutting a garment pattern from one or more layers of fabric comprising: a laser capable of producing ultraviolet light;   pattern means in optical communication with said laser light, said pattern means defining pathways for said laser light in the shape of said garment pattern;   lens means receiving said laser light in the shape of said garment pattern for focussing said laser light onto said one or more layers of fabric.   
     
     
       2. The apparatus as described in claim 1 wherein said laser comprises a noble gas excimer laser. 
     
     
       3. The apparatus as described in claim 2 wherein said noble gas excimer laser comprises a XeCl laser. 
     
     
       4. The apparatus as described in claim 3 wherein said XeCl laser produces said laser light at a wavelength of 308 nm. 
     
     
       5. The apparatus as described in claim 2 wherein said noble gas excimer laser comprises a KrF laser. 
     
     
       6. The apparatus as described in claim 5 wherein said KrF laser produces said laser light at a wavelength of 248 nm. 
     
     
       7. The apparatus as described in claim 1, further comprising table means for supporting said one or more layers of fabric at a focal plane of said lens means. 
     
     
       8. The apparatus as described in claim 1 wherein said pattern means comprises a holographic phase filter. 
     
     
       9. A method of cutting garment patterns from one or more layers of fabric comprising the steps of: shining ultraviolet light through a pathway defining said garment pattern;   focussing said ultraviolet light shined through said pathway defining said garment pattern onto said one or more layers of fabric;   wherein said garment pattern is cut into said one or more layers of fabric by photochemical decomposition.

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