Dampening water controller

Abstract

A dampening water controller for controlling the concentration of an etching solution in dampening water circulatively used in offset printing, includes an ion concentration measuring means capable of measuring the concentration of at least one kind of ion (object ions) selected from specific anions or cations contained only in an etching solution in dampening water. Information on the measured concentration of the ions in the dampening water is output. A dampening water temperature measuring device capable of measuring the temperature of the dampening water and outputting information on the measured temperatures is provided. Also, an ion concentration information correcting device is provided capable of correcting the information on the measured concentration of the ions in the dampening water, in accordance with the information on the measured temperature of the dampening water. The controller also includes an etching solution concentration adjusting device capable of adjusting the concentration of the etching solution in the dampening water, in accordance with the corrected information on the ion concentration.

What is claimed is: 
     
       1. A dampening water controller for controlling the concentration of an etching solution in dampening water circulatively used in offset printing, said controller comprising; an ion concentration measuring means for measuring the concentration of anions or cations contained in the etching solution in said dampening water; said anions being selected from the group consisting of nitrate ions, nitrite ions, phosphate ions, fluoride ions, sulfate ions and sulfide ions and said cations being selected from the group consisting of sodium ions, ammonium ions and potassium ions; and outputting information on the concentration of the ions in the dampening water after the measuring by said ion concentration measuring means;   a dampening water temperature measuring means for measuring a temperature of dampening water and outputting information on the temperature after the measuring by said dampening water temperature measuring means;   an ion concentration information correcting means for correcting said information measured by said ion concentration measuring means, in accordance with the information measured by said dampening water temperature measuring means; and   an etching solution concentration adjusting means for adjusting the concentration of the etching solution in the dampening water, in accordance with the information corrected by the ion concentration information correcting means.   
     
     
       2. A dampening water controller for controlling the concentration of an etching solution in dampening water circulatively used in offset printing, said controller comprising; an ion concentration measuring means for measuring the concentration of anions or cations contained in the etching solution in said dampening water; said anions being selected from the group consisting of nitrate ions, nitrite ions, phosphate ions, fluoride ions, sulfate ions and sulfide ions and said cations being selected from the group consisting of sodium ions, ammonium ions and potassium ions; and outputting information on the concentration of the ions in the dampening water after the measuring by said ion concentration measuring means;   a dampening water temperature measuring means for measuring a temperature of dampening water and outputting information on the temperature after the measuring by said dampening water temperature measuring means;   an ion concentration information correcting means for correcting the information measured by said ion concentration measuring means, in accordance with the information measured by said dampening water temperature measuring means;   an etching solution concentration information conversion means for converting the information corrected by the ion concentration information correcting means into information on the concentration of etching solution in the dampening water and outputting the information on the concentration of the etching solution; and   an etching solution concentration adjusting means for adjusting the concentration of the etching solution in the dampening water, in accordance with the information on the concentration of the etching solution.   
     
     
       3. The dampening water controller according to claim 2, wherein said etching solution concentration information conversion means is provided with a display means for displaying the information on the concentration of the etching solution. 
     
     
       4. The dampening water controller according to claim 1, wherein said ion concentration measuring means comprises an ion-selective electrode and a reference electrode. 
     
     
       5. The dampening water controller according to claim 2, wherein said ion concentration measuring means comprises the an ion-selective electrode and a reference electrode. 
     
     
       6. The dampening water controller according to claim 1, which is provided with an impurity separation means for removing impurities brought into the dampening water serving as a sample for examination, and feeding a resulting water free of impurities to a zone corresponding to the ion concentration measuring means. 
     
     
       7. The dampening water controller according to claim 2, which is provided with an impurity separation means for removing impurities brought into the dampening water serving as a sample for examination, and feeding a resulting water free of impurities to a zone corresponding to the ion concentration measuring means. 
     
     
       8. The dampening water controller according to claim 1, which is provided with a cation separation means for separating only cations from the dampening water serving as a sample for examination, and feeding a resulting dampening water free of cations to a zone corresponding to the ion concentration measuring means. 
     
     
       9. The dampening water controller according to claim 2, which is provided with a cation separation means for separating only cations from the dampening water serving as a sample for examination, and feeding a resulting dampening water free of cations to a zone corresponding to the ion concentration measuring means. 
     
     
       10. The dampening water controller according to claim 1, wherein the ions measured by said ion concentration measuring means are nitrate ions contained in the etching solution in the dampening water. 
     
     
       11. The dampening water controller according to claim 2, wherein the ions measured by said ion concentration measuring means are nitrate ions contained in the etching solution in said dampening water. 
     
     
       12. The dampening water controller according to claim 1, wherein the ions measured by said ion concentration measuring means are nitrite ions contained in the etching solution in said dampening water. 
     
     
       13. The dampening water controller according to claim 2, wherein the ions measured by said ion concentration measuring means are nitrite ions contained in the etching solution in said dampening water. 
     
     
       14. The dampening water controller according to claim 1, wherein the ions measured by said ion concentration measuring means are phosphate ions contained in the etching solution in said damping water. 
     
     
       15. The dampening water controller according to claim 2, wherein the ions measured by said ion concentration measuring means are phosphate ions contained in the etching solution in said dampening water.