Stripping with aqueous composition containing hydroxylamine and an alkanolamine

Abstract

An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of monoethanolamine, about 22.5 to 15% by weight of hydroxylamine and water. The stripping composition is effective to strip photoresists, residues from plasma process generated, organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.

What is claimed is: 
     
       1. A process for removing an organic coating from a coated substrate comprising applying to said coated substrate a stripping effective amount of the stripping composition consisting essentially of a mixture of: a) about 55% to about 70% by weight of monoethanolamine;   b) about 22.5 to about 15% by weight of hydroxylamine, and   c) the balance being water, permitting said stripping composition to reside on said coated substrate for a stripping effective period of time and removing the coating from said substrate.   
     
     
       2. A process for removing an organic coating from a coated substrate comprising applying to said coated substrate a stripping effective amount of the stripping composition consisting of about 62% by weight of monoethanolamine, about 19% by weight of hydroxylamine, and the balance being water, permitting said stripping composition to reside on said coated substrate for a stripping effective period of time and removing the coating from said substrate. 
     
     
       3. The process of claim 1 further consisting essentially of up to about 10% by weight of a corrosion inhibitor. 
     
     
       4. The process of claim 3 wherein said inhibitor is selected from the group consisting of catechol, pyrogallol, anthranilic acid, gallic acid and gallic ester. 
     
     
       5. The process of claim 1 wherein said coated substrate is a photoresist.