US5485333AExpiredUtility

Shorted DMR reproduce head

51
Assignee: EASTMAN KODAK COPriority: Apr 23, 1993Filed: Apr 23, 1993Granted: Jan 16, 1996
Est. expiryApr 23, 2013(expired)· nominal 20-yr term from priority
G11B 5/3954
51
PatentIndex Score
8
Cited by
22
References
5
Claims

Abstract

A shorted DMR reproduce head includes two substantially identical MR elements, separated by a thin film of titanium nitride having a resistivity of 1000 μΩ-cm. Signal loss due to current shunting in the shorted DMR head is significantly reduced by use of the titanium nitride film.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A shorted dual magnetoresistive (MR) reproduce head, comprising: a. a pair of magnetoresistive elements;   b. a spacer consisting of titanium nitride having a resistivity value of between 200 μΩ-cm and 2,000 μΩ-cm between said magnetoresistive elements; and   c. means for flowing electrical current in the same direction through said pair of MR elements and said spacer, wherein the current flowing through said spacer is substantially less than the electrical current flowing through said MR elements due to the much higher resistivity of said spacer than the resistivity of said MR elements, and wherein said signal loss of said reproduce head due to current shunting through said spacer is substantially reduced.   
     
     
       2. The shorted DMR reproduce head claimed in claim 1, wherein said titanium nitride spacer includes 3-12 atomic percent oxygen. 
     
     
       3. The shorted DMR reproduce head claimed in claim 1, wherein said titanium nitride spacer has a resistivity of 1,000 μΩ-cm. 
     
     
       4. The shorted DMR reproduce head of claim 1 wherein said spacer of titanium nitride is formed by reactive sputtering a film of titanium nitride on one of said pair of magnetorestrictive stripes and said other of said pair of magnetorestrictive stripes is formed on said film of titanium nitride. 
     
     
       5. The shorted DMR reproduce head of claim 4 wherein the surface of said film of titanium nitride is sputter etched or ion milled prior to forming said other of said pair of magnetorestrictive stripes on said film of titanium nitride.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.