P
US5569321AExpiredUtilityPatentIndex 49

Pre-treating solution for electroless plating

Assignee: HITACHI CHEMICAL CO LTDPriority: Apr 9, 1993Filed: Apr 8, 1994Granted: Oct 29, 1996
Est. expiryApr 9, 2013(expired)· nominal 20-yr term from priority
Inventors:TAKITA TAKAOSAKAI TAKESHISHIMAZAKI TAKESHI
H05K 3/381H05K 3/181C23C 18/22H05K 3/18
49
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References
2
Claims

Abstract

A pretreating solution for electroless plating comprising sulfuric acid, a halide, an organic acid and water as a diluent functions as an adhesion accelerating agent without generating etching corrosion, has a long life and provides excellent adhesiveness of plated copper to both glass cloth and substrate resins.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A pre-treating solution for electroless plating comprising sulfuric acid, a halide, an organic acid which is an aromatic carboxylic acid and water as a diluent wherein the sulfuric acid is contained in an amount of 0.70 to 2.50 mole/l, the halide is contained in an amount of 0.01 to 6.0 mole/l and the organic acid is contained in an amount of 0.005 to 1.5 mole/l and the aromatic carboxylic acid is benzoic acid or phthalic acid. 
     
     
       2. A pre-treating solution according to claim 1, wherein the halide is a chloride or bromide.

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