Proximity-dispensing high-throughput low-consumption resist coating device

Abstract

A minimal amount of waste in liquid resist material is achieved by dispensing through small openings at close proximity to the substrate. An airtight substrate chamber as well as airtight sealing of dispensing assembly and airtight sealing of the space that does not have to be opened for substrate loading and unloading, are used to facilitate a uniform and planarized coating after a high-speed spin off of excess resist.

I claim: 
     
       1. A method of coating a substrate with a soluble material comprising the steps of supporting a substrate within a proximity distance of liquid dispensing nozzles in a spin chamber;   maintaining a solvent vapor rich environment in said spin chamber;   depositing said soluble material upon said substrate from said dispensing nozzles;   disposing said dispensing nozzles to provide an aerodynamically non-turbulent surface; and   spinning said substrate, such that said soluble material is distributed about said substrate.   
     
     
       2. A method of coating a substrate with a soluble material comprising the steps of supporting a substrate within a proximity distance of liquid dispensing nozzles in a spin chamber;   maintaining a solvent vapor rich environment in said spin chamber;   controlling the temperature of said soluble material at substantially the same temperature as said solvent vapor during a part of said coating of said substrate by maintaining a resist reservoir in fluid communication with said spin chamber;   depositing said soluble material upon said substrate from said dispensing nozzles; and   spinning said substrate, such that said soluble material is distributed about said substrate.   
     
     
       3. The method of coating a substrate with a soluble material of claim 2 further comprising the step of disposing said dispensing nozzles, to provide an aerodynamically non-turbulent surface before spinning said substrate and after depositing said soluble material. 
     
     
       4. The method of coating a substrate with a soluble material of claim 3 further comprising the step of retaining solvent vapor in compartments in fluid communication with said substrate, to assist in maintaining said solvent vapor rich environment. 
     
     
       5. The method of coating a substrate with a soluble material of claim 4 further comprising the steps of loading said substrate into a spin chamber;   providing vapor for a solvent vapor rich environment in said spin chamber, before said step of supporting said substrate; and   removing said substrate from said spin chamber after spinning said substrate.   
     
     
       6. The method of coating a substrate with a soluble material of claim 5 further comprising the step of spinning said substrate while depositing said soluble material. 
     
     
       7. The method of coating a substrate with a soluble material of claim 6 further comprising the step of baking said substrate to dry said soluble material after removing said substrate from said spin chamber. 
     
     
       8. An apparatus for coating a substrate with a soluble material comprising a spin chamber;   a plurality of liquid dispensing nozzles in said spin chamber;   means for providing an aerodynamically non-turbulent surface across said dispensing nozzles;   means for supporting a substrate within a proximity distance of said dispensing nozzles;   means for maintaining a solvent vapor rich environment in said spin chamber; and   means for spinning said substrate, such that said soluble material is distributed about said substrate.   
     
     
       9. The apparatus for coating a substrate with a soluble material claim 8 further comprising means for maintaining said soluble material at substantially the same temperature as said solvent vapor. 
     
     
       10. The apparatus for coating a substrate with a soluble material of claim 9 further comprising means for providing an aerodynamically non-turbulent surface across said dispensing nozzles. 
     
     
       11. The apparatus for coating a substrate with a soluble material of claim 9 further comprising means for loading said substrate into a spin chamber; and   means for removing said substrate from said spin chamber.   
     
     
       12. The apparatus for coating a substrate with a soluble material of claim 11 further comprising means for baking said substrate such that said soluble material dries.