US5763289AExpiredUtility

Method for fabricating multi-layer polymer thin florelectro-optical device

30
Assignee: KOREA ELECTRONICS TELECOMMPriority: Dec 21, 1995Filed: Sep 12, 1996Granted: Jun 9, 1998
Est. expiryDec 21, 2015(expired)· nominal 20-yr term from priority
H10F 99/00G02F 1/01G02F 1/065
30
PatentIndex Score
1
Cited by
6
References
2
Claims

Abstract

A method for fabricating multi-layer polymer thin film of an electro-optical device which has a qualified multi-layer by using photobleaching characteristics of polymer. A proper time of photobleaching only changes the chemical, mechanical and electrical characteristics of the surface of the thin film without having any influence on characteristics of the device, so that when the multi-layer thin film are formed, such a cracking due to a solvent or melting, cracking due to the difference of mechanical tensile strength between each layer can be prevented, thereby obtaining a clean multi-layer thin film.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A method for forming a multi-layer polymer thin film comprising the step of: photobleaching a layer of the multi-layer polymer prior to deposition of another layer on said layer to prevent cracking due to the difference of mechanical tensile strength between each layer.   
     
     
       2. A method for fabricating an electro-optical modulating/switching device using multi-layer polymer thin film comprising the steps of: forming a lower electrode on a substrate;   forming a lower cladding layer on the lower electrode;   photobleaching the lower cladding layer under a light;   forming a waveguiding layer on the lower cladding layer;   photobleaching the waveguiding layer under a light;   forming an upper cladding on the waveguiding layer; and   forming an upper electrode on the upper cladding.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.