P
US5776540AExpiredUtilityPatentIndex 74

Process for manufacturing a praseodymium oxide- and manganese oxide-containing baseplate for use in field emission displays

Assignee: MICRON DISPLAY TECH INCPriority: May 14, 1996Filed: Dec 31, 1996Granted: Jul 7, 1998
Est. expiryMay 14, 2016(expired)· nominal 20-yr term from priority
Inventors:CHADHA SURJIT SRASMUSSEN ROBERT T
H01J 2329/00H01J 3/022H01J 29/863H01J 31/15
74
PatentIndex Score
10
Cited by
12
References
23
Claims

Abstract

A process for manufacturing a conductive and light-absorbing baseplate for use in a field emission display is disclosed. A surface of the baseplate is coated with a praseodymium oxide- and manganese oxide-containing layer having a resistivity that does not exceed 1×10 5 Ω-cm. The coating may be placed on the baseplate by radiofrequency sputtering, laser ablation, plasma deposition or the like. Suitable praseodymium sources include praseodymium acetate, praseodymium oxalate and Pr(THd) 3 , while suitable manganese sources include MnO 2 and MnCO 3 .

Claims

exact text as granted — not AI-modified
We claim: 
     
       1. A process for manufacturing a conductive and light-absorbing baseplate for use in field emission display, comprising coating a surface of a baseplate with a layer comprising praseodymium oxide and manganese oxide, wherein the layer has a resistivity which does not exceed 1×10 5  Ω-cm. 
     
     
       2. The process of claim 1 wherein the layer has a resistivity which does not exceed 1×10 4  Ω-cm. 
     
     
       3. The process of claim 1 wherein the layer has a resistivity which does not exceed 1×10 3  Ω-cm. 
     
     
       4. The process of claim 1 wherein the layer has a thickness which ranges from 1,000 Å to 15,000 Å. 
     
     
       5. The process of claim 1 wherein the layer has a light absorption coefficient of at least 1×10 5  cm -1  at a wavelength of 500 nm. 
     
     
       6. The process of claim 1 wherein the layer is coated on the surface of the baseplate by a coating process selected from the group consisting of radiofrequency sputtering, laser ablation, plasma deposition, chemical vapor deposition or electron beam evaporation. 
     
     
       7. The process of claim 1 wherein the layer is coated on the surface of the baseplate by radiofrequency sputtering. 
     
     
       8. The process of claim 7 wherein Pr 6  O 11  and a manganese source selected from MnO 2  and MnCO 3  form a sputtering target for the radiofrequency sputtering. 
     
     
       9. The process of claim 1 wherein the layer is coated on the surface of the baseplate by chemical vapor deposition. 
     
     
       10. The process of claim 9 wherein a praseodymium source selected from the group consisting of praseodymium acetate, praseodymium oxalate and Pr(THd) 3  is used to form the layer. 
     
     
       11. The process of claim 9 wherein a manganese source selected from the group consisting of manganese acetate, manganese carbonyl, manganese methoxide and manganese oxalate is used to form the layer. 
     
     
       12. The process of claim 1 further comprising, after the coating step, the step of firing the layer under a reducing atmosphere to lower its resistivity such that it does not exceed 1×10 4  Ω-cm. 
     
     
       13. The process of claim 12 wherein the reducing atmosphere is formed of hydrogen, carbon monoxide or a mixture threreof. 
     
     
       14. The process of claim 1 wherein the layer further comprises a conductive ion. 
     
     
       15. The process of claim 1 wherein the layer further comprises a metal. 
     
     
       16. The process of claim 1 wherein the layer consists essentially of praseodymium oxide and manganese oxide. 
     
     
       17. The process of claim 1 wherein the layer is formed of particles with an average particle diameter of about 2 μm. 
     
     
       18. The process of claim 1 wherein the layer is in contact with a conducting gate. 
     
     
       19. The process of claim 1 wherein the layer is in contact with a insulative layer. 
     
     
       20. The process of claim 1 wherein the layer has a molar ratio of praseodymium to manganese ranging from 0.1:1 to 1:0.1. 
     
     
       21. The process of claim 20 where in the molar ratio ranges from 0.5:1 to 1:0.5. 
     
     
       22. The process of claim 1 wherein the layer further comprises PrMnO 3 . 
     
     
       23. The process of claim 1 further comprising the step of assembling a field emission display utilizing the conductive and light-absorbing baseplate.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.