Liquid source formation of thin films using hexamethyl-disilazane

Abstract

A precursor liquid comprising several metal 2-ethylhexanoates, such as strontium, tantalum and bismuth 2-ethylhexanoates, in a solvent such as xylenes/methyl ethyl ketone and a small amount of hexamethyl-disilazane. The liquid is dried, baked, and annealed to form a thin film of a layered superlattice material, such as strontium bismuth tantalate, on the substrate.

We claim: 
     
       1. A liquid precursor for forming a metal oxide, said precursor comprising: a plurality of metal moieties in effective amounts for forming a layered superlattice material upon application said precursor to a substrate and heating; and a solvent comprising hexamethyl-disilazane. 
     
     
       2. A liquid precursor as in claim 1 wherein said solvent further includes a liquid selected from the group consisting of methyl ethyl ketone, isopropanal, methanol, tetrahydrofuran, xylene, n-butyl acetate, octane and 2-methoxyethanol.