Surface modification using an atmospheric pressure glow discharge plasma source

Abstract

A method for producing stable atmospheric pressure glow discharge plasmas using RF excitation and the use of said plasmas for modifying the surface layer of materials. The plasma generated by this process and its surface modification capability depend on the type of gases used and their chemical reactivity. These plasmas can be used for a variety of applications, including etching of organic material from the surface layer of inorganic substrates, as an environmentally benign alternative to industrial cleaning operations which currently employ solvents and degreasers, as a method of stripping paint from surfaces, for the surface modification of composites prior to adhesive bonding operations, for use as a localized etcher of electronic boards and assemblies and in microelectronic fabrication, and for the sterilization of tools used in medical applications.

What is claimed: 
     
       1. A method of surface modification comprising the steps of: providing a r.f. signal;   inducing an atmospheric pressure plasma utilizing said r.f signal, said r.f signal being capacitively coupled to a discharge chamber of a hand held apparatus; and,   immersing the surface in said atmospheric pressure plasma comprised of mixtures of oxygen and an inert gas.   
     
     
       2. A method for modifying a surface comprising the steps of: generating an atmospheric pressure r.f. plasma of oxygen/inert gas mixtures having a temperature of less than 100 degrees C.;   exposing the surface with said atmospheric pressure plasma having a temperature of less than 100 degrees C.   
     
     
       3. A method for providing an atomic oxygen source comprising the steps of: generating an atmospheric pressure plasma having a temperature of less than 100 degrees C.;   admixing oxygen in said atmospheric pressure plasma to provide atomic oxygen.