US5952781AExpiredUtility
Electrode for high contrast gas discharge panel and the method for manufacturing the same
Assignee: MATSUSHITA ELECTRIC INDUSTRIAL CO LTDPriority: Mar 9, 1998Filed: Mar 9, 1998Granted: Sep 14, 1999
Est. expiryMar 9, 2018(expired)· nominal 20-yr term from priority
H01J 11/22H01J 11/12H01J 2211/225H01J 9/20H01J 2211/444H01J 9/02
43
PatentIndex Score
5
Cited by
6
References
10
Claims
Abstract
A Cr-C-F crystalline film was found to be suitable for use as a black matrix layer for use in conjunction with a Cr/Cu/Cr PDP electrode. Furthermore, film stack including the foregoing Cr-C-F layer, a gradated Cr-C-F transition layer and a pure Cr film can be formed in an integrated sputter deposition process and can be used as a black matrix/adhesion layers in PDP Cu electrode.
Claims
exact text as granted — not AI-modifiedWhat is claimed:
1. A gas discharge panel including a transparent plate, a gas discharge electrode and a black matrix layer positioned between said transparent plate and said gas discharge electrode, said black matrix layer comprising a thin film of chromium/carbon/fluorine.
2. The gas discharge panel of claim 1, wherein said gas discharge electrode comprises a conductive layer formed of a thin film of conductive material positioned between a thin film of a material resistant to oxidation and a thin film formed of a material that can be adhered to said black matrix layer.
3. The gas discharge panel of claim 2, wherein said black matrix layer is a thin film of chromium/carbon/fluorine, said conductive material is copper, said material resistant to oxidation is chromium and said material that can be adhered to said black matrix layer is chromium.
4. The gas discharge panel of claim 3, further including a transition region between said black matrix layer and said thin film of chromium that can be adhered to said black matrix layer, said transition region comprising a gradated region of chromium/carbon/fluorine in which carbon and fluorine content of said transition region decreases as a distance decreases from said thin film of chromium that can be adhered to said black matrix layer.
5. The gas discharge panel of claim 1, wherein said transparent plate is formed of glass.
6. The gas discharge panel of claim 1, wherein an overall thickness of said black matrix layer is within a range from about 1000 to about 5000 Angstroms.
7. The gas discharge panel of claim 4, wherein each of said black matrix layer, said transition layer, said adhesive layer, said conductive layer and said layer resistant to oxidation are sequentially deposited on said transparent plate.
8. A black matrix layer for a gas discharge panel, said black matrix layer comprising a thin film of chromium/carbon/fluorine.
9. The black matrix layer of claim 8, further comprising an adhesion surface to which a conductive layer of a gas discharge electrode can be adhered, said black matrix layer including a first portion extending from a first side of said black matrix layer and having a thickness in which a composition of said layer is substantially uniform, and a gradated transition region extending between said first portion and said adhesion surface, wherein the carbon and fluorine content gradually diminishes in a direction of said adhesion surface.
10. The black matrix layer of claim 9, wherein said first portion and said transition region comprise chromium/carbon/fluorine and said adhesion surface is substantially pure chromium.Cited by (0)
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