US5954850AExpiredUtility
Method for making glass pressure capacitance transducers in batch
Priority: Nov 22, 1996Filed: Oct 22, 1997Granted: Sep 21, 1999
Est. expiryNov 22, 2016(expired)· nominal 20-yr term from priority
Y10T29/49007Y10T29/49103Y10T29/435G01L 9/0075Y10T29/43
37
PatentIndex Score
10
Cited by
15
References
10
Claims
Abstract
The present provides a method for making glass pressure sensors in batch. First glass plates of appropriate dimensions are scribed. Then electrodes are sputters onto each of the plates, followed by screen printing a frit layer and crossover tabs. The plates are then preglazed and bonded together to form a plurality of sensors. The plates are then scribed and broken along the scribes to form individual sensors.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A method for making glass pressure capacitance transducers in batch, comprising the steps of: (a) scribing first and second plates of uncoated glass; (b) cleaning said first and second plates; (c) fixing to a first side of said first plate a first aperture mask having an electrode pattern; (d) fixing to a first side of said second plate a second aperture mask having said electrode pattern; (e) sputtering said electrode pattern onto said first sides of said first and second plates; (f) removing said first and second aperture masks; (g) screen printing glass frit on to said first side of said first plate; (h) screen printing crossover tabs on an edge of said first side of said second plate; (i) preglazing said first and second plates; (j) fixing said first and second plates together so said respective first sides contact; (k) sealing and bonding said first and second plates together to form a plurality of sensors wherein said cross-over tabs form an electrically conductive path between said electrode patterns on said first and second plates; and (l) scribing and breaking said bonded plates along said scribes to form multiple sensors.
2. The method of claim 1 further comprising the steps of: fixing to a second side of said first plate a third aperture mask having a ground shield pattern; fixing to a second side of said second plate a fourth aperture mask having said ground shield pattern; sputtering said ground shield pattern onto said second sides of said first and second plates; and removing said third and fourth aperture masks.
3. The method of claim 2 wherein said sputtering of said electrode pattern and said ground shield pattern include a pre-sputtering etching step.
4. The method of claim 1 wherein said cleaning step includes ultrasonic cleaning, scrubbing and ozone cleaning.
5. The method of claim 1 further including after step (g) the step of letting said glass frit settle.
6. The method of claim 5 further including after said settling the steps of drying and hand lapping said glass frit.
7. The method of claim 1 further including after step (f) the step of sputtering onto one of said first sides a silicon dioxide insulator.
8. The method of claim 8 further including after step (l) the step of mounting an individual sensor on a housing base.
9. The method of claim 1 wherein step (k) includes the step of heating said plates in a vacuum.
10. The method of claim 1 further including after step (k) the step of running said plurality of sensors through a pressure cycle test.Cited by (0)
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