Method for producing a pattern on a transparent substrate
Abstract
The invention concerns a method for producing a pattern on a transparent substrate, particularly a glass or glass-ceramic substrate. According to the invention, there is deposited on at least one area of one face of the substrate, a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking d° such that it is able to absorb solid particles. Certain areas of said first layer are exposed to light, particularly in order to increase, in a controlled manner, the average degree of cross-linking d° of said polymer so as to modulate its absorption capacity. On the first layer is deposited at least one second layer of a mineral-particle-based composition. The substrate is subjected to at least one treatment cycle, particularly in order to fix said mineral particles. The invention also concerns the substrate produced by this method and its applications.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A method for producing a pattern on a transparent substrate comprising:
a) providing a transparent substrate and depositing on at least one area of one of the faces of the substrate a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking such that it is able to absorb solid particles and which absorption capacity can be varied as a function of exposure to light;
b) exposing certain areas of said first layer to light to increase, the average degree of cross-linking of said polymer wherein the absorption capacity of the polymer is modulated as a function of light exposure;
c) depositing on said first layer at least one second layer of a mineral particle containing composition having a particle size that can be absorbed by the unexposed areas of the first layer;
d) removing excess particles of the second layer not absorbed in the first layer; and
e) subjecting said substrate to a first treatment cycle in order to fix said mineral particles in said second layer.
2. The method according to claim 1 , wherein the first treatment of the substrate according to step e) is a heat treatment or ultraviolet treatment.
3. The method according to claim 1 , wherein said sensitizing agent is 1-N(methylbenzothiazolylidene) methyl dithioacetate.
4. The method according to claim 1 , wherein said polymer is ethylene-glycol and butanediol polycynamylidene malonate.
5. The method according to claim 1 , wherein step b) is performed by means of a radiation source illuminating the entire surface of a plate having the desired pattern and superimposed on said first layer, by means of a point radiation source whose beam sweeps said areas on the first layer, or by the projection of an image.
6. The method according to claim 1 , wherein the diameters of the mineral particles are less than or equal to the thickness of said first layer.
7. The method according to claim 6 , wherein the diameters of 90% of said mineral particles are less than or equal to 10 μm.
8. The method according to claim 1 , wherein according to step d) the substrate is subjected to a heat treatment cycle for fixing the mineral particles at temperatures greater than or equal to the melting points of at least some of the mineral particles.
9. The method according to claim 8 , wherein the heat treatment cycle for fixing the mineral particles is part of a quenching, annealing or bending cycle for said substrate.
10. The method according to claim 8 , wherein the substrate is subjected to an additional heat treatment cycle before the first treatment for fixing the mineral particles, so as to burn off said photosensitive resin, at a temperature of about 350° C. for a duration of approximately 6 to 24 minutes per μm of thickness of said first layer.
11. The method according to claim 1 , wherein said mineral particle containing composition includes a metal powder, a ceramic powder, a metal-oxide-based powder, or functional particles of the liquid-crystal or phosphorus-particle.
12. The method according to claim 1 , wherein said mineral particle containing composition includes an enamel composition comprising at least one glass frit.
13. The method according to claim 12 , wherein said enamel composition also includes pigments.
14. The method according to claim 13 , wherein the diameters of the pigments are about equal to that of the particles of the glass frit.
15. The method according to claim 13 , wherein the diameters of 90% of the pigments are less than 10 μm.
16. The method according to claim 13 , wherein the pigments are added in proportions such that the weight ratio of the glass frit to the pigments is between 50:50 and 90:10.
17. The method according to claim 13 , wherein said enamel composition includes mica pigments as its major constituent.
18. A method for producing a pattern on a transparent substrate comprising:
a) depositing on at least one area of one of the faces of the substrate a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking such that it is able to absorb solid particles;
b) exposing certain areas of said first layer to light to increase the average degree of cross-linking of said polymer wherein the absorption capacity of the polymer is modulated as a function of light exposure;
c) depositing on said first layer at least one second layer of a mineral particle containing composition that includes an enamel composition that comprises at least one glass frit and pigments;
d) removing excess enamel not absorbed in the first layer; and
e) repeating steps a), b), c) and d) a plurality of n times in succession on the same area is with the alternating deposition of a photosensitive hydrophilic resin and a photosensitive hydrophobic resin, and each of the enamel compositions contains black, white, or single-color pigments as its majority constituent
e) subjecting said substrate to a first treatment cycle in order to fix said enamel in said second layer.
19. The method according to claim 18 , wherein n is equal to 4 and the four enamel compositions together contain black pigments as their major constituent and impart the three primary colors, and each of them includes as its major constituent black pigments or pigments imparting only one of the three primary colors.
20. The method according to claim 18 , wherein the first photosensitive resin deposited is hydrophilic.
21. A method of manufacturing a decorative glass substrate comprising:
a) providing a transparent substrate and depositing on at least one area of one of the faces of the substrate a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking such that it is able to absorb solid particles;
b) exposing certain areas of said first layer to light to increase, the average degree of cross-linking of said polymer wherein the absorption capacity of the polymer is modulated as a function of light exposure;
c) depositing on said first layer at least one second layer of a mineral particle containing composition having a particle size that can be absorbed by the unexposed areas of the first layer;
d) removing particles of the second layer not absorbed in the first layer; and
e) subjecting said substrate to at least one heat treatment cycle in order to fix said mineral particles in the second layer;
wherein the decorative glass substrate includes a glass-covered luminous sign, a glass oven door with an oven molding, a display window, and a stained-glass window.
22. A method of manufacturing a substrate that forms the front of a flat emittive screens comprising the steps of:
a) providing a transparent substrate and depositing on at least one area of one of the faces of the substrate a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking such that it is able to absorb solid particles;
b) exposing certain areas of said first layer to light to increase, the average degree of cross-linking of said polymer wherein the absorption capacity of the polymer is modulated as a function of light exposure;
c) depositing on said first layer at least one second layer of a mineral particle containing composition having a particle size that can be absorbed by the unexposed areas of the first layer;
d) removing particles of the second layer not absorbed in the first layer; and
e) subjecting said substrate to at least one heat treatment cycle in order to fix said mineral particles in the second layer.Cited by (0)
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