Method of fabricating semiconductor device

Abstract

There is provided a method of fabricating a semiconductor device having a multi-layered structure and including an interlayer insulating film composed of carbon family material, the method including the steps of (a) depositing an insulating film on a lower wiring layer, the insulating film being composed of carbon family material, (b) annealing the insulating film in hydrogen atmosphere at a first temperature equal to or greater than a temperature at which the insulating film has been deposited, and (c) forming an upper wiring layer on the insulating film. The method suppresses gas from being discharged out of an insulating film without an increase in dielectric constant, and prevents deposited films on the insulating film from being peeled off.

What is claimed is:  
     
       1. A method of fabricating a semiconductor device including an insulating film composed of carbon family material, said method comprising the steps of: 
       (a) depositing an insulating film composed of carbon family material; and  
       (b) annealing said insulating film in a hydrogen atmosphere at atmospheric pressure.  
     
     
       2. The method as set forth in claim  1 , wherein said insulating film is deposited by any one of plasma-enhanced chemical vapor deposition, thermal chemical vapor deposition, and spin coating. 
     
     
       3. The method as set forth in claim  1 , wherein said insulating film is composed of hydrogen-containing amorphous carbon. 
     
     
       4. The method as set forth in claim  3 , further comprising the step of locally reducing a hydrogen concentration in the vicinity of interfaces between said hydrogen-containing insulating film and other films. 
     
     
       5. The method as set forth in claim  1 , wherein said insulating film is composed of fluorine-containing amorphous carbon. 
     
     
       6. The method as set forth in claim  5 , further comprising the step of locally reducing a fluorine concentration in the vicinity of interfaces between said fluorine-containing insulating film and other films. 
     
     
       7. The method as set forth in claim  1 , wherein said insulating film is composed of poly-p-xylylene. 
     
     
       8. The method as set forth in claim  1 , wherein said insulating film is composed of polyimide. 
     
     
       9. The method as set forth in claim  1 , wherein said hydrogen atmosphere contains inert gas. 
     
     
       10. The method as set forth in claim  1 , wherein said step (b) is carried out at a first temperature equal to or greater than a temperature at which said insulating film has been deposited. 
     
     
       11. The method as set forth in claim  10 , wherein said first temperature is equal to or greater than 200 degrees centigrade, and equal to or lower than a second temperature at which said insulating film is decomposed. 
     
     
       12. The method as set forth in claim  10 , wherein said first temperature is equal to or greater than 200 degrees centigrade, and equal to or lower than 450 degrees centigrade. 
     
     
       13. A method of fabricating a semiconductor device having a multi-layered structure and including an interlayer insulating film composed of carbon family material, said method comprising the steps of: 
       (a) depositing an insulating film on a lower wiring layer, said insulating film being composed of carbon family material;  
       (b) annealing said insulating film in a hydrogen atmosphere at atmospheric pressure; and  
       (c) forming an upper wiring layer on said insulating film.  
     
     
       14. The method as set forth in claim  13 , wherein said insulating film is deposited by any one of plasma-enhanced chemical vapor deposition, thermal chemical vapor deposition, and spin coating. 
     
     
       15. The method as set forth in claim  13 , wherein said insulating film is composed of hydrogen-containing amorphous carbon. 
     
     
       16. The method as set forth in claim  15 , further comprising the step of locally reducing a hydrogen concentration in the vicinity of interfaces between said hydrogen-containing insulating film and other films. 
     
     
       17. The method as set forth in claim  13 , wherein said insulating film is composed of fluorine-containing amorphous carbon. 
     
     
       18. The method as set forth in claim  17 , further comprising the step of locally reducing a fluorine concentration in the vicinity of interfaces between said fluorine-containing insulating film and other films. 
     
     
       19. The method as set forth in claim  13 , wherein said insulating film is composed of poly-p-xylylene. 
     
     
       20. The method as set forth in claim  13 , wherein said insulating film is composed of polyimide. 
     
     
       21. The method as set forth in claim  13 , wherein said hydrogen atmosphere contains inert gas. 
     
     
       22. The method as set forth in claim  13 , wherein said step (b) is carried out at a first temperature equal to or greater than a temperature at which said insulating film has been deposited. 
     
     
       23. The method as set forth in claim  22 , wherein said first temperature is equal to or greater than 200 degrees centigrade, and equal to or lower than a second temperature at which said insulating film is decomposed. 
     
     
       24. The method as set forth in claim  22 , wherein said first temperature is equal to or greater than 200 degrees centigrade, and equal to or lower than 450 degrees centigrade.