Reflective liquid crystal display and method for fabricating the same

Abstract

The present invention relates to a light reflection plate provided on a substrate included in a reflective liquid crystal display device. The light reflection plate comprises the following elements. Convex patterns are shaped in random and formed on the substrate. The convex patterns have side walls defining apertures, bottoms of which are defined by the substrate. At least a light reflective film is made of a conductive material and continuously extending over the convex patterns and within the apertures to have the light reflective film possess a rough surface comprising convex and concave portions which have random sizes in relation to the convex patterns.

What is claimed is:  
     
       1. A light reflection plate for a reflective liquid crystal display, comprising: 
       a substrate;  
       plural rigid projections on a surface of said substrate, said projections being irregularly shaped and having side walls defining apertures, bottoms of said apertures being said surface of said substrate, said substrate comprising recessed portions between said projections; and  
       a light reflective film comprising an electrically conductive material extending continuously over said projections, said film having a rough surface with peaks and valleys that are related to the corresponding irregularly shaped plural rigid projections and apertures therebeneath.  
     
     
       2. The plate of claim  1 , wherein the plate comprises thin film transistors on said surface of said substrate, said thin film transistors comprising plural layers of materials, and wherein said projections comprise plural layers of said materials that correspond layer-for-layer with said materials of said plural layers of said thin film transistors. 
     
     
       3. The plate of claim  1 , wherein said side walls are substantially perpendicular to said surface of said substrate. 
     
     
       4. The plate of claim  1 , wherein said side walls are oblique to said surface of said substrate. 
     
     
       5. The plate of claim  1 , further comprising an interlayer insulator between said projections and said light reflective film, said insulator having a rough surface corresponding to the peaks and valleys of said film. 
     
     
       6. A liquid crystal display device comprising the light reflection plate of claim  1 . 
     
     
       7. The plate of claim  1 , wherein the display comprises metal-insulation metal (MIM) diodes on said surface of said substrate, said MIM diodes comprising plural layers of materials, and 
       wherein said projections comprise plural layers of said materials that correspond layer-for-layer with said materials of said plural layers of said MIM diodes.  
     
     
       8. The plate of claim  1 , wherein tops of a plurality of said irregularly shaped projections have irregular notches therein. 
     
     
       9. The plate of claim  1 , wherein said projections have a plurality of different heights and widths. 
     
     
       10. A method for forming a light reflection plate on a substrate for a reflective liquid crystal display device, said method comprising the steps of: 
       forming irregularly shaped and diversely positioned, rigid projections on a surface of the substrate, the projections having sidewalls defining apertures, bottoms of the apertures being the substrate;  
       forming recessed portions in the substrate between the projections; and  
       forming a conductive light reflective film continuously over the projections and the apertures so that the light reflective film possesses a rough surface with convex and concave portions having positions and sizes related to positions and sizes of the projections.  
     
     
       11. The method of claim  10 , further comprising the steps of forming thin film transistors on the substrate, the thin film transistors comprising plural layers of materials, and forming the projections with plural layers of the materials that correspond layer-for-layer with the materials of the plural layers of the thin film transistors. 
     
     
       12. The method of claim  10 , wherein the side walls are formed substantially perpendicular to the substrate. 
     
     
       13. The method of claim  10 , wherein the side walls are formed oblique to the substrate. 
     
     
       14. The method of claim  10 , further comprising the step of providing an interlayer insulator between the projections and the light reflective film, the insulator being provided with a rough surface corresponding to the convex and concave portions of the film. 
     
     
       15. The plate of claim  10 , further comprising the steps of forming MIM diodes on the substrate, the MIM diodes comprising plural layers of materials, and forming the projections with plural layers of the materials that correspond layer-for-layer with the materials of the plural layers of the MIM diodes. 
     
     
       16. The method of claim  10 , wherein tops of a plurality of said irregularly shaped projections have irregular notches therein. 
     
     
       17. The method of claim  10 , wherein said projections have a plurality of different heights and widths.