Process for coating amorphous carbon coating on to an x-ray target

Abstract

A method of manufacturing an x-ray target by positioning an x-ray target having an alloy surface and a graphite surface in a sputtering chamber is disclosed. The x-ray target is then coated over the graphite surface with non-hydrogenated amorphous carbon.

What is claimed:  
     
       1. A method of forming a coating on an x-ray target comprising: 
       positioning an x-ray target including an alloy target section and a graphite section within a sputtering chamber and sputter depositing a non-hydrogenated amorphopus carbon coating over at least a portion of the graphite section.  
     
     
       2. The method of  claim 1  wherein a carbon sputtering target is used. 
     
     
       3. The method of  claim 2  wherein said graphite section and said carbon sputtering target are substantially chemically equivalent. 
     
     
       4. The method of  claim 1  wherein said sputtering chamber is operated at a pressure of less than about 5 millitorr. 
     
     
       5. The method of  claim 1  wherein an RF or DC magnetron sputtering gun is used. 
     
     
       6. The method of  claim 1  wherein argon provides a source of sputtering ions. 
     
     
       7. The method of  claim 1  wherein said x-ray target is rotated during the sputter depositing. 
     
     
       8. The method of  claim 1  being performed until the carbon coating is between about 1.6 and 2.0 microns in depth. 
     
     
       9. The method of  claim 1  continued for 3 to 12 hours.