Developer solution and edge bead remover composition

Abstract

A developer solution and edge bead remover. composition includes: (A) water; (B) at least a basic compound; and (C) a non-ionic surfactant having the structure (I):  wherein: R1, R2, R3, R4 and R5 are selected from the group consisting of hydrogen, alkyl, aryl, aralkyl and halogen, and at least two of R1, R2, R3, R4 and RS are selected from the group consisting of aralkyl and aryl, R6 is selected from the group consisting of ethylene, propylene, and butylene, R7 is selected from the group consisting of hydrogen, acetyl, alkyl, and aryl, and n is an integer ranging from 6 to 23.

We claim:  
     
       1. A developer solution composition which is provided for use in developing treatment of an actinic ray-sensitive resist said developer solution composition comprising: 
       (A) water;  
       (B) 0.01˜5 wt % of at least a basic compound; and  
       (C) 0.01˜3.5 wt % of a non-ionic surfactant having the structure (I):                    
        wherein:  
       R 1 , R 3 , and R 5  are selected from the group consisting of hydrogen, alkyl, aryl, aralkyl and halogen, and R 2  and R 4  are each phenyl ethyl,  
       R 6  is selected from the group consisting of ethylene, propylene, and butylene,  
       R 7  is selected from the group consisting of hydrogen, acetyl, alkyl, and aryl, and  
       n is an integer ranging from 6 to 23.  
     
     
       2. A developer solution composition which is provided for use in developing treatment of an actinic ray-sensitive resist, said developer solution composition comprising: 
       (A) water;  
       (B) 0.01 ˜5 wt % of at least a basic compound; and  
       (C) 0.01˜3.5 wt % of a non-ionic surfactant having the structure (I):                    
        wherein:  
       R 2  and R 4  are selected from the group consisting of hydrogen, alkyl, aryl, aralkyl and halogen, and R 1 , R 3  and R 5  are each phenyl ethyl,  
       R 6  is selected from the group consisting of ethylene, propylene, and butylene,  
       R 7  is selected from the group consisting of hydrogen, acetyl, alkyl, and aryl, and  
       n is an integer ranging from 6 to 23.  
     
     
       3. An edge bead remover composition for removing undesired photoresist residue stuck to the periphery of a liquid crystal display substrate, said edge bead remover composition comprising: 
       (A) water;  
       (B) 0.5˜15 wt % of at least a basic compound; and  
       (C) 0.1˜10 wt % of a non-ionic surfactant having the structure (I):                    
        wherein:  
       R 1 , R 3  and R 5  are selected from the group consisting of hydrogen, alkyl, aryl, aralkyl and halogen, and R 2  and R 4  are each phenyl ethyl,  
       R 6  is selected from the group consisting of ethylene, propylene, and butylene,  
       R 7  is selected from the group consisting of hydrogen, acetyl, alkyl, and aryl, and  
       n is an integer ranging from 6 to 23.  
     
     
       4. An edge bead remover composition for removing undesired photoresist residue stuck to the periphery of a liquid crystal display substrate, said edge bead remover composition comprising: 
       (A) water;  
       (B) 0.5˜15 wt % of at least a basic compound; and  
       (C) 0.1˜10 wt % of a non-ionic surfactant having the structure (I):                    
        wherein:  
       R 2  and R 4  are selected from the group consisting of hydrogen, alkyl, aryl, aralkyl and halogen, and R 1 , R 3  and R 5  are each phenyl ethyl,  
       R 6  is selected from the group consisting of ethylene, propylene, and butylene,  
       R 7  is selected from the group consisting of hydrogen, acetyl, alkyl, and aryl, and  
       n is an integer ranging from 6 to 23.